作者
I Utke, B Dwir, K Leifer, Fabio Cicoira, P Doppelt, P Hoffmann, E Kapon
发表日期
2000/6/1
期刊
Microelectronic Engineering
卷号
53
期号
1-4
页码范围
261-264
出版商
Elsevier
简介
Resistivity measurements and composition analysis of electron beam induced deposition (EBID) with two novel inorganic carbon-free precursors [RhCl(PF3)2]2 (CAS 14876-98-3) and AuCl(PF3) (CAS 141845-34-3) are compared with results obtained from metallorganic CVD precursors Me2Au-tfa (CAS 63470-53-1) and Me2Au-hfa (CAS 63470-54-2). A deposit/metal resistivity ratio of 10 was obtained for EBID with AuCl(PF3).
引用总数
学术搜索中的文章
I Utke, B Dwir, K Leifer, F Cicoira, P Doppelt… - Microelectronic Engineering, 2000