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This work presents a novel method for determining bulk etch rate of CR-39 during prolonged etching by masking the surface with a ferrofluidic film held in position by magnetostatic forces. The CR-39 etching conditions were 6.25M NaOH solution for 24h at temperatures ranging from 50 to 80°C. After etching, the heights of the resulting un-etched plateaus were measured using a Talyscan 150 profilometer. The removed layer thicknesses ranged from 12 to 85μm, giving corresponding bulk etch rates in the range 0.5–3.54μm/h.