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We report high aspect ratio nanochannel fabrication in glass using single-shot femtosecond Bessel beams of sub-3 J pulse energies at 800 nm. We obtain near-parallel nanochannels with diameters in the range 200–800 nm, and aspect ratios that can exceed 100. An array of 230 nm diameter channels with 1.6 m pitch illustrates the reproducibility of this approach and the potential for writing periodic structures. We also report proof-of-principle machining of a through-channel of 400 nm diameter in a 43 m thick membrane. These results represent a significant advance of femtosecond laser ablation technology into the nanometric regime.© 2010 American Institute of Physics. doi: 10.1063/1.3479419

Femtosecond fs laser machining of dielectrics has found wide application, from waveguide writing to the fabrication of nanometer scale structures. 1 A particular challenge, however, is fabricating high aspect ratio channels …