作者
Malay Bikas Chowdhuri, Shigeru Morita, Motoshi Goto
发表日期
2008/1/10
期刊
Applied Optics
卷号
47
期号
2
页码范围
135-146
出版商
Optica Publishing Group
简介
A flat-field extreme ultraviolet (EUV) spectrometer with a nominal 2400 grooves/mm aberration-corrected ruled grating has been developed to analyze the emission spectrum in the wavelength range of 10 to 130 Å from large helical device (LHD) plasmas. Spectral properties such as resolution, sensitivity, contribution of higher-order light, and background stray light have been studied using emission spectra mainly from intrinsic impurities, e.g., C and Fe. It is found that the spectrometer well resolves closely existing spectral lines of highly ionized medium- and high-Z impurities even in a very short wavelength range such as 10 to 20 Å. As a result, it allows one to study the charge state distribution of elements in high-temperature fusion plasma. The ruled grating was then replaced by a laminar type holographic grating for the comparative study. The spectral resolution for the ruled grating (Δλ~0.08 Å at 33.73 Å) is clearly …
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