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Radio-Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD), and Pulsed Laser Deposition (PLD) techniques were used to deposit boron carbide (B_xC) thin films. Films were investigated to compare crystallinity, chemical composition, optical properties, and residual stress. X-ray diffraction analysis revealed that the film deposited by PLD was amorphous, while PECVD technique yielded crystalline B_xC film. PLD technique provided films with better stoichiometric purity with B₄C being the most dominant phase, as observed in XPS spectra. However, super-stoichiometric phase (B_xC (x > 4)) was dominant in PECVD film. Moreover, the PECVD film had greater adhesion (Lc₃ ~29.5 N), hardness (~2798 HK), and lubricity (COF~ 0.03) compared to PLD deposited film. Optically, PECVD deposited film have higher value of refractive indices (1.82 at 600 nm) and lower extinction coefficient. Finally, residual …