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Transmission electron microscopy (TEM) was utilized to investigate microstructures of heteroepitaxial SiC/Si films, grown from single-source precursors such as tetramethylsilane [TMS, Si(CH3)4], hexamethyldisilane [HMDS, Si2(CH3)6], and 1,3-disilabutane [1,3-DSB, H3SiCH2SiH2CH3]. In the case of TMS/H2 and HMDS/H2 samples, SiC/Si films grown at relatively high precursor concentration and/or low temperatures showed columnar grains with a high degree of epitaxial relationship with the Si substrate. Higher quality films with larger grains were observed in the case of high temperature and/or low precursor concentration samples, although a high density of interfacial voids was observed. Samples grown from pure 1,3-DSB at a low pressure showed high quality single crystalline films with few interfacial voids. It was suggested that the microstructural behavior of these films closely resembles that of the SiC …