发明者
Kiwamu Sakuma, Haruka Kusai, Shosuke Fujii, Li Zhang, Masahiro Kiyotoshi, Masao Shingu
发表日期
2014/4/29
专利局
US
专利号
8710580
专利申请号
13689026
简介
According to one embodiment, a semiconductor device includes first to n-th semiconductor layers (n is a natural number equal to or more than 2) being stacked in order from a Surface of an insulating layer in a first direction perpendicu lar to the surface of the insulating layer, the first to n-th semiconductor layers extending in a second direction parallel to the Surface of the insulating layer, the first to n-th semicon ductor layers being insulated from each other, a common electrode connected to the first to n-th semiconductor layers in a first end of the second direction thereof, and a layer select transistor which uses the first to n-th semiconductor layers as channels and which selects one of the first to n-th semicon ductor layers.
引用总数
2013201420152016201720182019202020212022202320242432437257829647
学术搜索中的文章
K Sakuma, H Kusai, S Fujii, L Zhang, M Kiyotoshi… - US Patent 8,710,580, 2014
K Sakuma, D Matsushita, K Kato, Y Nakasaki, I Hirano… - US Patent 7,749,919, 2010