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This review highlights the most significant advances of the nanofabrication techniques reported over the past decade with a particular focus on the approaches tailored towards the fabrication of functional nano-devices. The review is divided into two sections: top–down and bottom–up nanofabrication. Under the classification of top–down, special attention is given to technical reports that demonstrate multi-directional patterning capabilities less than or equal to 100nm. These include recent advances in lithographic techniques, such as optical, electron beam, soft, nanoimprint, scanning probe, and block copolymer lithography. Bottom–up nanofabrication techniques—such as, atomic layer deposition, sol–gel nanofabrication, molecular self-assembly, vapor-phase deposition and DNA-scaffolding for nanoelectronics—are also discussed. Specifically, we describe advances in the fabrication of functional …