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This paper proposes a new approach to optical proximity correction (OPC) using an adjustable OPCed cell and genetic algorithms (GA) to achieve optimal OPC feature generation for the full-chip area at fast operational speeds. GA is an efficient optimization technique based on population genetics. In this new approach, an adjustable OPCed cell consists of two parts. The first part is the original design data. The second part consists of two kinds of OPC features. The first kind is referred to as "fixed features", which include OPC feature data from a conventional OPC technique. The second kind, named "adjustable features", are located in the peripheral regions of the cell and include adjustable OPC variables. As the values of these variables are greatly influenced by neighboring cell patterns, the variables are quickly optimized by the GA after chip layout. The effectiveness of this approach, in terms of reduced …