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Jiri Houska
Jiri Houska
在 kfy.zcu.cz 的电子邮件经过验证 - 首页
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Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance
J Vlček, Š Potocký, J Čížek, J Houška, M Kormunda, P Zeman, V Peřina, ...
Journal of Vacuum Science & Technology A 23 (6), 1513-1522, 2005
962005
Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films
J Vlček, J Rezek, J Houška, R Čerstvý, R Bugyi
Surface and Coatings Technology 236, 550-556, 2013
912013
Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
J Vlček, J Rezek, J Houška, T Kozák, J Kohout
Vacuum 114, 131-141, 2015
772015
Overview of optical properties of Al2O3 films prepared by various techniques
J Houska, J Blazek, J Rezek, S Proksova
Thin Solid Films 520 (16), 5405-5408, 2012
732012
Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering
J Houška, J Vlček, Š Potocký, V Peřina
Diamond and related materials 16 (1), 29-36, 2007
692007
Significant improvement of the performance of ZrO2/V1-xWxO2/ZrO2 thermochromic coatings by utilizing a second-order interference
J Houska, D Kolenaty, J Vlcek, T Barta, J Rezek, R Cerstvy
Solar energy materials and solar cells 191, 365-371, 2019
632019
High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films
J Vlček, A Belosludtsev, J Rezek, J Houška, J Čapek, R Čerstvý, S Haviar
Surface and Coatings Technology 290, 58-64, 2016
572016
Properties of nanocrystalline Al–Cu–O films reactively sputtered by DC pulse dual magnetron
J Blažek, J Musil, P Stupka, R Čerstvý, J Houška
Applied Surface Science 258 (5), 1762-1767, 2011
572011
Characterization of thermochromic VO2 (prepared at 250° C) in a wide temperature range by spectroscopic ellipsometry
J Houska, D Kolenaty, J Rezek, J Vlcek
Applied Surface Science 421, 529-534, 2017
542017
Controlled reactive HiPIMS—effective technique for low-temperature (300 C) synthesis of VO2 films with semiconductor-to-metal transition
J Vlček, D Kolenatý, J Houška, T Kozák, R Čerstvý
Journal of Physics D: Applied Physics 50 (38), 38LT01, 2017
502017
Effect of the gas mixture composition on high-temperature behavior of magnetron sputtered Si–B–C–N coatings
J Čapek, S Hřeben, P Zeman, J Vlček, R Čerstvý, J Houška
Surface and Coatings Technology 203 (5-7), 466-469, 2008
502008
Atomistic simulations of the characteristics of TiSiN nanocomposites of various compositions
J Houska, JE Klemberg-Sapieha, L Martinu
Surface and Coatings Technology 203 (22), 3348-3355, 2009
452009
Effect of nitrogen content on electronic structure and properties of SiBCN materials
V Petrman, J Houska, S Kos, P Calta, J Vlcek
Acta Materialia 59 (6), 2341-2349, 2011
422011
Effect of B and the Si/C ratio on high-temperature stability of Si–B–C–N materials
J Houška, J Vlček, S Hřeben, MMM Bilek, DR McKenzie
Europhysics Letters 76 (3), 512, 2006
422006
Pathway for a low-temperature deposition of α-Al2O3: A molecular dynamics study
J Houska
Surface and Coatings Technology 235, 333-341, 2013
382013
High-performance thermochromic VO2-based coatings with a low transition temperature deposited on glass by a scalable technique
D Kolenatý, J Vlček, T Bárta, J Rezek, J Houška, S Haviar
Scientific reports 10 (1), 11107, 2020
362020
Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control
NW Pi, M Zhang, J Jiang, A Belosludtsev, J Vlček, J Houška, EI Meletis
Thin Solid Films 619, 239-249, 2016
342016
Trends in formation energies and elastic moduli of ternary and quaternary transition metal nitrides
V Petrman, J Houska
Journal of Materials Science 48, 7642-7651, 2013
332013
Experimental and molecular dynamics study of the growth of crystalline TiO2
J Houska, S Mraz, JM Schneider
Journal of Applied Physics 112 (7), 2012
332012
A study of the microstructure evolution of hard Zr–B–C–N films by high-resolution transmission electron microscopy
M Zhang, J Jiang, J Houška, J Kohout, J Vlček, EI Meletis
Acta materialia 77, 212-222, 2014
322014
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