Toward design rules for enzyme immobilization in hierarchical mesoporous metal-organic frameworks P Li, JA Modica, AJ Howarth, E Vargas, PZ Moghadam, RQ Snurr, ... Chem 1 (1), 154-169, 2016 | 314 | 2016 |
An emerging consensus on voltage-dependent gating from computational modeling and molecular dynamics simulations E Vargas, V Yarov-Yarovoy, F Khalili-Araghi, WA Catterall, ML Klein, ... Journal of General Physiology 140 (6), 587-594, 2012 | 225 | 2012 |
In search of a consensus model of the resting state of a voltage-sensing domain E Vargas, F Bezanilla, B Roux Neuron 72 (5), 713-720, 2011 | 107 | 2011 |
A Molecular Mechanism for Differential Recognition of Membrane Phosphatidylserine by the Immune Regulatory Receptor Tim4 GT Tietjen, Z Gong, CH Chen, E Vargas, JE Crooks, KD Cao, CTR Heffern, ... Biophysical Journal 106 (2), 17a, 2014 | 92 | 2014 |
Gating currents from Kv7 channels carrying neuronal hyperexcitability mutations in the voltage-sensing domain F Miceli, E Vargas, F Bezanilla, M Taglialatela Biophysical Journal 102 (6), 1372-1382, 2012 | 49 | 2012 |
LPP EUV source development for HVM DC Brandt, IV Fomenkov, AI Ershov, WN Partlo, DW Myers, NR Böwering, ... Emerging Lithographic Technologies XI 6517, 230-239, 2007 | 41 | 2007 |
Heterogeneous diffusion of alkanes in the hierarchical metal–organic framework NU-1000 E Vargas L, RQ Snurr Langmuir 31 (36), 10056-10065, 2015 | 40 | 2015 |
Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source CL Rettig, JR Hoffman, EL Vargas US Patent 7,217,941, 2007 | 32 | 2007 |
EUV source collector NR Böwering, AI Ershov, WF Marx, V Khodykin, BAM Hansson, E Vargas, ... Emerging Lithographic Technologies X 6151, 1018-1026, 2006 | 32 | 2006 |
Laser-produced plasma source system development IV Fomenkov, DC Brandt, AN Bykanov, AI Ershov, WN Partlo, DW Myers, ... Emerging Lithographic Technologies XI 6517, 1021-1031, 2007 | 28 | 2007 |
Helium retention and diffusivity in flowing liquid lithium M Nieto, DN Ruzic, JP Allain, MD Coventry, E Vargas-Lopez Journal of nuclear materials 313, 646-650, 2003 | 27 | 2003 |
LPP EUV source development for HVM BAM Hansson, IV Fomenkov, NR Böwering, AI Ershov, WN Partlo, ... Emerging Lithographic Technologies X 6151, 220-229, 2006 | 24 | 2006 |
FLIRE—flowing liquid surface retention experiment, design and testing JP Allain, M Nieto, MD Coventry, MJ Neumann, E Vargas-Lopez, ... Fusion engineering and design 61, 245-250, 2002 | 23 | 2002 |
Nano-positioning system for structural analysis of functional homomeric proteins in multiple conformations HC Hyde, W Sandtner, E Vargas, AT Dagcan, JL Robertson, B Roux, ... Structure 20 (10), 1629-1640, 2012 | 19 | 2012 |
Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources EV López, BE Jurczyk, MA Jaworski, MJ Neumann, DN Ruzic Microelectronic engineering 77 (2), 95-102, 2005 | 16 | 2005 |
Illinois debris-mitigation EUV applications laboratory BE Jurczyk, E Vargas-Lopez, MN Neumann, DN Ruzic Microelectronic engineering 77 (2), 103-109, 2005 | 11 | 2005 |
L., Simmons, RD, Chavez, JA, Chrobak, CP IV Fomenkov, DC Brandt, AN Bykanov, AI Ershov, WN Partlo, DW Myers, ... Proc. of SPIE Vol. 6517, Emerging Lithographic Technologies XI, 2007 | 6 | 2007 |
Protection of collector optics in an LPP based EUV source CL Rettig, OV Khodykin, JR Hoffman, WF Marx, NR Bowering, E Vargas, ... Emerging Lithographic Technologies IX 5751, 910-918, 2005 | 4 | 2005 |
Illinois Debris-Mitigation EUV Applications Laboratory (IDEAL) BE Jurczyk, EV Lopez, MJ Neumann, DN Ruzic Emerging Lithographic Technologies VIII 5374, 695-701, 2004 | 4 | 2004 |
LPP EUV Source System I Fomenkov, NR Bowering, AI Ershov Presentation at EUVL symposium, Oct 17, 2006 | 3 | 2006 |