| Stiction in surface micromachining N Tas, T Sonnenberg, H Jansen, R Legtenberg, M Elwenspoek Journal of Micromechanics and Microengineering 6 (4), 385, 1996 | 760 | 1996 |
| The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control H Jansen, M de Boer, R Legtenberg, M Elwenspoek Journal of Micromechanics and Microengineering 5 (2), 115, 1995 | 741 | 1995 |
| A survey on the reactive ion etching of silicon in microtechnology H Jansen, H Gardeniers, M de Boer, M Elwenspoek, J Fluitman Journal of micromechanics and microengineering 6 (1), 14, 1996 | 674 | 1996 |
| Silicon micromachining M Elwenspoek, M Elwenspoek, HV Jansen Cambridge university press, 2004 | 591 | 2004 |
| Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as … HV Jansen, MJ De Boer, S Unnikrishnan, MC Louwerse, MC Elwenspoek Journal of micromechanics and microengineering 19 (3), 033001, 2009 | 363 | 2009 |
| Capillary filling speed of water in nanochannels NR Tas, J Haneveld, HV Jansen, M Elwenspoek, A van den Berg Applied Physics Letters 85 (15), 3274-3276, 2004 | 332 | 2004 |
| Silicon nitride nanosieve membrane HD Tong, HV Jansen, VJ Gadgil, CG Bostan, E Berenschot, CJM van Rijn, ... Nano letters 4 (2), 283-287, 2004 | 317 | 2004 |
| Micromachining of buried micro channels in silicon MJ de Boer, RW Tjerkstra, JW Berenschot, HV Jansen, GJ Burger, ... Journal of Microelectromechanical systems 9 (1), 94-103, 2000 | 317 | 2000 |
| The μ-flown: a novel device for measuring acoustic flows HE de Bree, P Leussink, T Korthorst, H Jansen, TSJ Lammerink, ... Sensors and actuators A: Physical 54 (1-3), 552-557, 1996 | 315* | 1996 |
| Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures MJ De Boer, JGE Gardeniers, HV Jansen, E Smulders, MJ Gilde, ... Journal of microelectromechanical systems 11 (4), 385-401, 2002 | 314 | 2002 |
| Anisotropic reactive ion etching of silicon using SF 6/O 2/CHF 3 gas mixtures R Legtenberg, H Jansen, M de Boer, M Elwenspoek Journal of the electrochemical society 142 (6), 2020, 1995 | 274 | 1995 |
| Method and system for fabrication of integrated tunable/switchable passive microwave and millimeter wave modules H Tilmans, E Beyne, H Jansen, W De Raedt US Patent 6,876,056, 2005 | 258* | 2005 |
| Ta2O5 as gate dielectric material for low-voltage organic thin-film transistors C Bartic, H Jansen, A Campitelli, S Borghs Organic electronics 3 (2), 65-72, 2002 | 212 | 2002 |
| BSM 7: RIE lag in high aspect ratio trench etching of silicon H Jansen, M de Boer, R Wiegerink, N Tas, E Smulders, C Neagu, ... Microelectronic Engineering 35 (1-4), 45-50, 1997 | 189 | 1997 |
| Capillary filling of sub-10nm nanochannels J Haneveld, NR Tas, N Brunets, HV Jansen, M Elwenspoek Journal of applied physics 104 (1), 2008 | 174 | 2008 |
| The black silicon method II: The effect of mask material and loading on the reactive ion etching of deep silicon trenches H Jansen, M de Boer, J Burger, R Legtenberg, M Elwenspoek Microelectronic engineering 27 (1-4), 475-480, 1995 | 161 | 1995 |
| Characterization of a planar microcoil for implantable microsystems CR Neagu, HV Jansen, A Smith, JGE Gardeniers, MC Elwenspoek Sensors and Actuators A: Physical 62 (1-3), 599-611, 1997 | 153 | 1997 |
| High resolution powder blast micromachining H Wensink, JW Berenschot, HV Jansen, MC Elwenspoek Proceedings IEEE Thirteenth Annual International Conference on Micro Electro …, 2000 | 140 | 2000 |
| A capacitive RF power sensor based on MEMS technology LJ Fernandez, RJ Wiegerink, J Flokstra, J Sese, HV Jansen, ... Journal of Micromechanics and Microengineering 16 (7), 1099, 2006 | 134 | 2006 |
| Wet anisotropic etching for fluidic 1D nanochannels J Haneveld, H Jansen, E Berenschot, N Tas, M Elwenspoek Journal of micromechanics and microengineering 13 (4), S62, 2003 | 131 | 2003 |
