| Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends V Miikkulainen, M Leskelä, M Ritala, RL Puurunen Journal of Applied Physics 113 (2), 2013 | 1661 | 2013 |
| Atomic layer deposition of spinel lithium manganese oxide by film-body-controlled lithium incorporation for thin-film lithium-ion batteries V Miikkulainen, A Ruud, E Østreng, O Nilsen, M Laitinen, T Sajavaara, ... The Journal of Physical Chemistry C 118 (2), 1258-1268, 2014 | 87 | 2014 |
| Effect of corona pre-treatment on the performance of gas barrier layers applied by atomic layer deposition onto polymer-coated paperboard T Hirvikorpi, M Vähä-Nissi, A Harlin, J Marles, V Miikkulainen, ... Applied Surface Science 257 (3), 736-740, 2010 | 77 | 2010 |
| Atomic layer deposition of molybdenum nitride from bis (tert-butylimido)-bis (dimethylamido) molybdenum and ammonia onto several types of substrate materials with equal growth … V Miikkulainen, M Suvanto, TA Pakkanen Chemistry of materials 19 (2), 263-269, 2007 | 70 | 2007 |
| Controlling the crystallinity and roughness of atomic layer deposited titanium dioxide films RL Puurunen, T Sajavaara, E Santala, V Miikkulainen, T Saukkonen, ... Journal of nanoscience and nanotechnology 11 (9), 8101-8107, 2011 | 68 | 2011 |
| Atomic layer deposition of functional films for Li‐ion microbatteries O Nilsen, V Miikkulainen, KB Gandrud, E Østreng, A Ruud, H Fjellvåg physica status solidi (a) 211 (2), 357-367, 2014 | 64 | 2014 |
| Atomic layer deposition of Li x Ti y O z thin films V Miikkulainen, O Nilsen, M Laitinen, T Sajavaara, H Fjellvåg RSC advances 3 (20), 7537-7542, 2013 | 57 | 2013 |
| Studies of the electrochemical behavior of LiNi0. 80Co0. 15Al0. 05O2 electrodes coated with LiAlO2 O Srur-Lavi, V Miikkulainen, B Markovsky, J Grinblat, M Talianker, ... Journal of The Electrochemical Society 164 (13), A3266, 2017 | 52 | 2017 |
| Bis(tert‐butylimido)‐bis(dialkylamido) Complexes of Molybdenum as Atomic Layer Deposition (ALD) Precursors for Molybdenum Nitride: the Effect of the Alkyl Group V Miikkulainen, M Suvanto, TA Pakkanen Chemical Vapor Deposition 14 (3‐4), 71-77, 2008 | 48 | 2008 |
| Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check WA Lanford, M Parenti, BJ Nordell, MM Paquette, AN Caruso, ... Nuclear Instruments and Methods in Physics Research Section B: Beam …, 2016 | 43 | 2016 |
| Towards space-grade 3D-printed, ALD-coated small satellite propulsion components for fluidics A Kestilä, K Nordling, V Miikkulainen, M Kaipio, T Tikka, M Salmi, A Auer, ... Additive manufacturing 22, 31-37, 2018 | 42 | 2018 |
| Electrical characterization of amorphous LiAlO 2 thin films deposited by atomic layer deposition Y Hu, A Ruud, V Miikkulainen, T Norby, O Nilsen, H Fjellvåg RSC advances 6 (65), 60479-60486, 2016 | 40 | 2016 |
| Thin films of MoN, WN, and perfluorinated silane deposited from dimethylamido precursors as contamination resistant coatings on micro-injection mold inserts V Miikkulainen, M Suvanto, TA Pakkanen, S Siitonen, P Karvinen, ... Surface and Coatings Technology 202 (21), 5103-5109, 2008 | 35 | 2008 |
| Understanding the stabilizing effects of nanoscale metal oxide and Li–metal oxide coatings on lithium-ion battery positive electrode materials Z Ahaliabadeh, V Miikkulainen, M Mantymaki, S Mousavihashemi, ... ACS Applied Materials & Interfaces 13 (36), 42773-42790, 2021 | 25 | 2021 |
| Atomic layer deposited lithium aluminum oxide:(In) dependency of film properties from pulsing sequence V Miikkulainen, O Nilsen, H Li, SW King, M Laitinen, T Sajavaara, ... Journal of Vacuum Science & Technology A 33 (1), 2015 | 24 | 2015 |
| Molybdenum nitride nanotubes V Miikkulainen, M Suvanto, TA Pakkanen Thin solid films 516 (18), 6041-6047, 2008 | 22 | 2008 |
| Enhanced process and composition control for atomic layer deposition with lithium trimethylsilanolate A Ruud, V Miikkulainen, K Mizohata, H Fjellvåg, O Nilsen Journal of Vacuum Science & Technology A 35 (1), 2017 | 20 | 2017 |
| Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls E Österlund, H Seppänen, K Bespalova, V Miikkulainen, ... Journal of Vacuum Science & Technology A 39 (3), 2021 | 19 | 2021 |
| Atomic layer deposition as pore diameter adjustment tool for nanoporous aluminum oxide injection molding masks V Miikkulainen, T Rasilainen, E Puukilainen, M Suvanto, TA Pakkanen Langmuir 24 (9), 4473-4477, 2008 | 19 | 2008 |
| Intercalation of Lithium Ions from Gaseous Precursors into β-MnO2 Thin Films Deposited by Atomic Layer Deposition HE Nieminen, V Miikkulainen, D Settipani, L Simonelli, P Hönicke, ... The Journal of Physical Chemistry C 123 (25), 15802-15814, 2019 | 15 | 2019 |
Ola NilsenUniversity of Oslo在 kjemi.uio.no 的电子邮件经过验证
