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Jung Hoon Lee
Jung Hoon Lee
在 krict.re.kr 的电子邮件经过验证
标题
引用次数
引用次数
年份
Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development
J Sheng, JH Lee, WH Choi, TH Hong, MJ Kim, JS Park
Journal of Vacuum Science & Technology A 36 (6), 2018
1182018
Non-epitaxial single-crystal 2D material growth by geometric confinement
KS Kim, D Lee, CS Chang, S Seo, Y Hu, S Cha, H Kim, J Shin, JH Lee, ...
Nature 614 (7946), 88-94, 2023
852023
Undoped tin dioxide transparent electrodes for efficient and cost-effective indoor organic photovoltaics (SnO2electrode for indoor organic photovoltaics)
JH Lee, YJ You, MA Saeed, SH Kim, SH Choi, S Kim, SY Lee, JS Park, ...
NPG Asia Materials 13 (1), 43, 2021
612021
Improving the leakage characteristics and efficiency of GaN-based micro-light-emitting diode with optimized passivation
DH Lee, JH Lee, JS Park, TY Seong, H Amano
ECS Journal of Solid State Science and Technology 9 (5), 055001, 2020
482020
Undoped ZnO electrodes for low-cost indoor organic photovoltaics
JS Goo, JH Lee, SC Shin, JS Park, JW Shim
Journal of Materials Chemistry A 6 (46), 23464-23472, 2018
472018
Control of phonon transport by the formation of the Al 2 O 3 interlayer in Al 2 O 3–ZnO superlattice thin films and their in-plane thermoelectric energy generator performance
NW Park, JY Ahn, TH Park, JH Lee, WY Lee, K Cho, YG Yoon, CJ Choi, ...
Nanoscale 9 (21), 7027-7036, 2017
462017
Enhancing the thermoelectric properties of super-lattice Al2O3/ZnO atomic film via interface confinement
JH Lee, TH Park, SH Lee, NW Park, WY Lee, JH Lim, SK Lee, JS Park
Ceramics International 42 (13), 14411-14415, 2016
372016
Metastable rhombohedral phase transition of semiconducting indium oxide controlled by thermal atomic layer deposition
JH Lee, J Sheng, H An, TH Hong, HY Kim, HK Lee, JH Seok, JW Park, ...
Chemistry of Materials 32 (17), 7397-7403, 2020
342020
Highly dense and stable p-type thin-film transistor based on atomic layer deposition SnO fabricated by two-step crystallization
HM Kim, SH Choi, HJ Jeong, JH Lee, J Kim, JS Park
ACS Applied Materials & Interfaces 13 (26), 30818-30825, 2021
302021
Selective SnOx Atomic Layer Deposition Driven by Oxygen Reactants
JH Lee, M Yoo, DH Kang, HM Lee, W Choi, JW Park, Y Yi, HY Kim, ...
ACS applied materials & interfaces 10 (39), 33335-33342, 2018
302018
Studies of thermoelectric transport properties of atomic layer deposited gallium-doped ZnO
SH Lee, JH Lee, SJ Choi, JS Park
Ceramics International 43 (10), 7784-7788, 2017
292017
Molecular layer deposition of indicone and organic-inorganic hybrid thin films as flexible transparent conductor
S Lee, GH Baek, JH Lee, TTN Van, AS Ansari, B Shong, JS Park
Applied Surface Science 525, 146383, 2020
262020
The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants
J Park, TH Jung, JH Lee, HS Kim, JS Park
Ceramics International 41 (1), 1839-1845, 2015
252015
Facile fabrication of p-type Al2O3/carbon nanocomposite films using molecular layer deposition
S Lee, GH Baek, JH Lee, DW Choi, B Shong, JS Park
Applied Surface Science 458, 864-871, 2018
242018
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H2O as a Reactant
HM Kim, JH Lee, SH Lee, R Harada, T Shigetomi, S Lee, T Tsugawa, ...
Chemistry of Materials 33 (12), 4353-4361, 2021
212021
Direct Probing of Cross-Plane Thermal Properties of Atomic Layer Deposition Al2O3/ZnO Superlattice Films with an Improved Figure of Merit and Their Cross …
NW Park, WY Lee, YS Yoon, JY Ahn, JH Lee, GS Kim, TG Kim, CJ Choi, ...
ACS applied materials & interfaces 10 (51), 44472-44482, 2018
162018
Anisotropic temperature-dependent thermal conductivity by an Al2O3 interlayer in Al2O3/ZnO superlattice films
WY Lee, JH Lee, JY Ahn, TH Park, NW Park, GS Kim, JS Park, SK Lee
Nanotechnology 28 (10), 105401, 2017
152017
Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant
GH Baek, S Lee, JH Lee, JS Park
Journal of Vacuum Science & Technology A 38 (2), 2020
142020
Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N, N′-tert-butyl-1, 1-dimethylethylenediamine silylene]
JH Lee, HM Kim, SH Lee, JW Park, J Park, JS Park
Applied Surface Science 493, 125-130, 2019
32019
Recent Progress on Metal Oxide Semiconductor Thin Film Transistor Application via Atomic Layer Deposition Method
J Sheng, JH Lee, TH Hong, WH Choi, JS Park
TMS 2019 148th Annual Meeting & Exhibition Supplemental Proceedings, 115-120, 2019
2019
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