Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development J Sheng, JH Lee, WH Choi, TH Hong, MJ Kim, JS Park Journal of Vacuum Science & Technology A 36 (6), 2018 | 118 | 2018 |
Non-epitaxial single-crystal 2D material growth by geometric confinement KS Kim, D Lee, CS Chang, S Seo, Y Hu, S Cha, H Kim, J Shin, JH Lee, ... Nature 614 (7946), 88-94, 2023 | 85 | 2023 |
Undoped tin dioxide transparent electrodes for efficient and cost-effective indoor organic photovoltaics (SnO2electrode for indoor organic photovoltaics) JH Lee, YJ You, MA Saeed, SH Kim, SH Choi, S Kim, SY Lee, JS Park, ... NPG Asia Materials 13 (1), 43, 2021 | 61 | 2021 |
Improving the leakage characteristics and efficiency of GaN-based micro-light-emitting diode with optimized passivation DH Lee, JH Lee, JS Park, TY Seong, H Amano ECS Journal of Solid State Science and Technology 9 (5), 055001, 2020 | 48 | 2020 |
Undoped ZnO electrodes for low-cost indoor organic photovoltaics JS Goo, JH Lee, SC Shin, JS Park, JW Shim Journal of Materials Chemistry A 6 (46), 23464-23472, 2018 | 47 | 2018 |
Control of phonon transport by the formation of the Al 2 O 3 interlayer in Al 2 O 3–ZnO superlattice thin films and their in-plane thermoelectric energy generator performance NW Park, JY Ahn, TH Park, JH Lee, WY Lee, K Cho, YG Yoon, CJ Choi, ... Nanoscale 9 (21), 7027-7036, 2017 | 46 | 2017 |
Enhancing the thermoelectric properties of super-lattice Al2O3/ZnO atomic film via interface confinement JH Lee, TH Park, SH Lee, NW Park, WY Lee, JH Lim, SK Lee, JS Park Ceramics International 42 (13), 14411-14415, 2016 | 37 | 2016 |
Metastable rhombohedral phase transition of semiconducting indium oxide controlled by thermal atomic layer deposition JH Lee, J Sheng, H An, TH Hong, HY Kim, HK Lee, JH Seok, JW Park, ... Chemistry of Materials 32 (17), 7397-7403, 2020 | 34 | 2020 |
Highly dense and stable p-type thin-film transistor based on atomic layer deposition SnO fabricated by two-step crystallization HM Kim, SH Choi, HJ Jeong, JH Lee, J Kim, JS Park ACS Applied Materials & Interfaces 13 (26), 30818-30825, 2021 | 30 | 2021 |
Selective SnOx Atomic Layer Deposition Driven by Oxygen Reactants JH Lee, M Yoo, DH Kang, HM Lee, W Choi, JW Park, Y Yi, HY Kim, ... ACS applied materials & interfaces 10 (39), 33335-33342, 2018 | 30 | 2018 |
Studies of thermoelectric transport properties of atomic layer deposited gallium-doped ZnO SH Lee, JH Lee, SJ Choi, JS Park Ceramics International 43 (10), 7784-7788, 2017 | 29 | 2017 |
Molecular layer deposition of indicone and organic-inorganic hybrid thin films as flexible transparent conductor S Lee, GH Baek, JH Lee, TTN Van, AS Ansari, B Shong, JS Park Applied Surface Science 525, 146383, 2020 | 26 | 2020 |
The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants J Park, TH Jung, JH Lee, HS Kim, JS Park Ceramics International 41 (1), 1839-1845, 2015 | 25 | 2015 |
Facile fabrication of p-type Al2O3/carbon nanocomposite films using molecular layer deposition S Lee, GH Baek, JH Lee, DW Choi, B Shong, JS Park Applied Surface Science 458, 864-871, 2018 | 24 | 2018 |
Area-Selective Atomic Layer Deposition of Ruthenium Using a Novel Ru Precursor and H2O as a Reactant HM Kim, JH Lee, SH Lee, R Harada, T Shigetomi, S Lee, T Tsugawa, ... Chemistry of Materials 33 (12), 4353-4361, 2021 | 21 | 2021 |
Direct Probing of Cross-Plane Thermal Properties of Atomic Layer Deposition Al2O3/ZnO Superlattice Films with an Improved Figure of Merit and Their Cross … NW Park, WY Lee, YS Yoon, JY Ahn, JH Lee, GS Kim, TG Kim, CJ Choi, ... ACS applied materials & interfaces 10 (51), 44472-44482, 2018 | 16 | 2018 |
Anisotropic temperature-dependent thermal conductivity by an Al2O3 interlayer in Al2O3/ZnO superlattice films WY Lee, JH Lee, JY Ahn, TH Park, NW Park, GS Kim, JS Park, SK Lee Nanotechnology 28 (10), 105401, 2017 | 15 | 2017 |
Air-stable alucone thin films deposited by molecular layer deposition using a 4-mercaptophenol organic reactant GH Baek, S Lee, JH Lee, JS Park Journal of Vacuum Science & Technology A 38 (2), 2020 | 14 | 2020 |
Plasma enhanced atomic layer deposited silicon dioxide with divalent Si precursor [N, N′-tert-butyl-1, 1-dimethylethylenediamine silylene] JH Lee, HM Kim, SH Lee, JW Park, J Park, JS Park Applied Surface Science 493, 125-130, 2019 | 3 | 2019 |
Recent Progress on Metal Oxide Semiconductor Thin Film Transistor Application via Atomic Layer Deposition Method J Sheng, JH Lee, TH Hong, WH Choi, JS Park TMS 2019 148th Annual Meeting & Exhibition Supplemental Proceedings, 115-120, 2019 | | 2019 |