| Low temperature thermal atomic layer deposition of cobalt metal films JP Klesko, MM Kerrigan, CH Winter Chemistry of Materials 28 (3), 700-703, 2016 | 86 | 2016 |
| Low Temperature, Selective Atomic Layer Deposition of Cobalt Metal Films Using Bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and Alkylamine Precursors MM Kerrigan, JP Klesko, CH Winter Chemistry of Materials 29 (17), 7458-7466, 2017 | 61 | 2017 |
| Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid MM Kerrigan, JP Klesko, SM Rupich, CL Dezelah, RK Kanjolia, ... Journal of Chemical Physics 146 (5), 052813, 2017 | 51 | 2017 |
| Thermal atomic layer deposition of titanium films using titanium tetrachloride and 2-methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-bis(trimethylsilyl)-1,4 … JP Klesko, CM Thrush, CH Winter Chemistry of Materials 27 (14), 4918-4921, 2015 | 49 | 2015 |
| Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films MM Kerrigan, JP Klesko, KJ Blakeney, CH Winter ACS Applied Materials & Interfaces, 2018 | 40 | 2018 |
| Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water JP Klesko, R Rahman, A Dangerfield, CE Nanayakkara, T L’Esperance, ... Chemistry of Materials, 2018 | 27 | 2018 |
| Thermal atomic layer etching of silica and alumina thin films using trimethylaluminum with hydrogen fluoride or fluoroform R Rahman, EC Mattson, JP Klesko, A Dangerfield, S Rivillon-Amy, ... ACS applied materials & interfaces 10 (37), 31784-31794, 2018 | 23 | 2018 |
| Metallic materials deposition: metal‐organic precursors CH Winter, TJ Knisley, LC Kalutarage, MA Zavada, JP Klesko, ... Encyclopedia of Inorganic and Bioinorganic Chemistry, 2011 | 21 | 2011 |
| Reactivity of Atomic Layer Deposition Precursors with OH/H2O-Containing Metal Organic Framework Materials K Tan, S Jensen, L Feng, H Wang, S Yuan, M Ferreri, JP Klesko, ... Chemistry of Materials 31 (7), 2286-2295, 2019 | 19 | 2019 |
| Bis (trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrate CH Winter, JP Klesko US Patent 9,249,505, 2016 | 14 | 2016 |
| Mechanistic study of the atomic layer deposition of scandium oxide films using Sc (MeCp) 2 (Me2pz) and ozone R Rahman, JP Klesko, A Dangerfield, M Fang, JSM Lehn, CL Dezelah, ... Journal of Vacuum Science & Technology A 37 (1), 2019 | 5 | 2019 |
| Selective Growth of Interface Layers from Reactions of Sc(MeCp)2(Me2pz) with Oxide Substrates R Rahman, JP Klesko, A Dangerfield, EC Mattson, YJ Chabal ACS applied materials & interfaces 10 (38), 32818-32827, 2018 | 4 | 2018 |
| Bis (trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrate CH Winter, JP Klesko US Patent 9,157,149, 2015 | 3 | 2015 |
| Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone JP Klesko, JA Bellow, MJ Saly, CH Winter, J Julin, T Sajavaara Journal of Vacuum Science & Technology A 34 (5), 051515, 2016 | 2 | 2016 |
| Reconfigurable unpatterned metasurfaces via acoustoelectric gating of graphene A Siddiqui, A Jarzembski, SW Schmucker, RL Paldi, S Tiwari, J Koepke, ... SPIE PC12497, Novel Patterning Technologies 2023, 2023 | | 2023 |
| Bis (trimethylsilyl) six-membered ring systems and related compounds as reducing agents for forming layers on a substrate CH Winter, JP Klesko US Patent 10,533,023, 2020 | | 2020 |
| Challenges for selective atomic layer deposition Y Chabal, R Rahman, J Klesko, A Dangerfield ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 255, 2018 | | 2018 |
| Atomic Layer Deposition of SnO2 from a novel tributyltin ethoxide precursor and ozone G Liu, A Vega, C Nanayakkara, A Dangerfield, J Klesko, C Dezelah, ... 16th International Conference on Atomic Layer Deposition, 2016 | | 2016 |
| Substrate dependence of Hall and Field-effect mobilities in few-layer MoS2 field-effect transistors B Chamlagain, M Perera, HJ Chuang, A Bowman, U Rijal, K Andrews, ... APS March Meeting Abstracts 2016, E15. 009, 2016 | | 2016 |
| New chemistry for the growth of first-row transition metal films by atomic layer deposition JP Klesko Ph.D. Dissertation, Wayne State University, Detroit, MI, 2015, 2016 | | 2016 |
Yves Jean ChabalUniversity of Texas at Dallas在 utdallas.edu 的电子邮件经过验证
