| Generation, shaping, and characterization of intense femtosecond pulses tunable from 3 to 20 µm RA Kaindl, M Wurm, K Reimann, P Hamm, AM Weiner, M Woerner JOSA B 17 (12), 2086-2094, 2000 | 475 | 2000 |
| Mathematical modelling of indirect measurements in scatterometry H Gross, R Model, M Bär, M Wurm, B Bodermann, A Rathsfeld Measurement 39 (9), 782-794, 2006 | 113 | 2006 |
| A maximum likelihood approach to the inverse problem of scatterometry MA Henn, H Gross, F Scholze, M Wurm, C Elster, M Bär Optics Express 20 (12), 12771-12786, 2012 | 61 | 2012 |
| A new flexible scatterometer for critical dimension metrology M Wurm, F Pilarski, B Bodermann Review of Scientific Instruments 81 (2), 2010 | 50 | 2010 |
| Ultrafast dynamics of intersubband excitations in a quasi-two-dimensional hole gas RA Kaindl, M Wurm, K Reimann, M Woerner, T Elsaesser, C Miesner, ... Physical Review Letters 86 (6), 1122, 2001 | 46 | 2001 |
| Metrology of nanoscale grating structures by UV scatterometry M Wurm, J Endres, J Probst, M Schoengen, A Diener, B Bodermann Optics express 25 (3), 2460-2468, 2017 | 44 | 2017 |
| Deep ultraviolet scatterometer for dimensional characterization of nanostructures: system improvements and test measurements M Wurm, S Bonifer, B Bodermann, J Richter Measurement Science and Technology 22 (9), 094024, 2011 | 37 | 2011 |
| EUV and DUV scatterometry for CD and edge profile metrology on EUV masks B Bodermann, M Wurm, A Diener, F Scholze, H Groß 25th European mask and lithography conference, 1-12, 2009 | 26 | 2009 |
| Investigations of the influence of common approximations in scatterometry for dimensional nanometrology J Endres, A Diener, M Wurm, B Bodermann Measurement Science and Technology 25 (4), 044004, 2014 | 23 | 2014 |
| First steps towards a scatterometry reference standard B Bodermann, PE Hansen, S Burger, MA Henn, H Gross, M Bär, ... Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and …, 2012 | 21 | 2012 |
| A scatterometry inverse problem in optical mask metrology R Model, A Rathsfeld, H Gross, M Wurm, B Bodermann Journal of Physics: Conference Series 135 (1), 012071, 2008 | 21 | 2008 |
| Optical metrology of micro-and nanostructures at PTB: status and future developments B Bodermann, E Buhr, G Ehret, F Scholze, M Wurm Ninth International Symposium on Laser Metrology 7155, 286-297, 2008 | 18 | 2008 |
| Über die dimensionelle Charakterisierung von Gitterstrukturen auf Fotomasken mit einem neuartigen DUV-Scatterometer M Wurm | 18 | 2008 |
| Metrology capabilities and performance of the new DUV scatterometer of the PTB M Wurm, B Bodermann, F Pilarski 23rd European Mask and Lithography Conference, 1-8, 2007 | 18 | 2007 |
| Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing E Agocs, B Bodermann, S Burger, G Dai, J Endres, PE Hansen, L Nielson, ... Nanoengineering: Fabrication, Properties, Optics, and Devices XII 9556, 153-164, 2015 | 16 | 2015 |
| Evaluation of scatterometry tools for critical dimension metrology M Wurm, B Bodermann, W Mirandé DGaO Proc. 106, 2005 | 14 | 2005 |
| Efficient Bayesian inversion for shape reconstruction of lithography masks N Farchmin, M Hammerschmidt, PI Schneider, M Wurm, B Bodermann, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 19 (2), 024001-024001, 2020 | 12 | 2020 |
| Efficient global sensitivity analysis for silicon line gratings using polynomial chaos N Farchmin, M Hammerschmidt, PI Schneider, M Wurm, B Bodermann, ... Modeling aspects in optical metrology VII 11057, 115-121, 2019 | 12 | 2019 |
| Numerical analysis of DUV scatterometry on EUV masks M Wurm, B Bodermann, R Model, H Gross Modeling Aspects in Optical Metrology 6617, 352-363, 2007 | 12 | 2007 |
| Some aspects on the uncertainty calculation in Mueller ellipsometry M Wurm, T Grunewald, S Teichert, B Bodermann, J Reck, U Richter Optics express 28 (6), 8108-8131, 2020 | 11 | 2020 |
Markus BärPhysikalisch-Technische Bundesanstalt (PTB); TU Berlin, Theoretical Physics在 ptb.de 的电子邮件经过验证
