关注
松浦 哲也 / Tetsuya, MATSUURA
松浦 哲也 / Tetsuya, MATSUURA
Precision and Intelligence Laboratory, Tokyo Institute of Technology
在 dowa.co.jp 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Enhanced efficiency of Cd-free Cu (In, Ga)(Se, S) 2 minimodule via (Zn, Mg) O second buffer layer and alkali metal post-treatment
T Kato, A Handa, T Yagioka, T Matsuura, K Yamamoto, S Higashi, JL Wu, ...
IEEE journal of photovoltaics 7 (6), 1773-1780, 2017
1182017
Sb surfactant effect on GaInAs/GaAs highly strained quantum well lasers emitting at 1200 nm range grown by molecular beam epitaxy
T Kageyama, T Miyamoto, M Ohta, T Matsuura, Y Matsui, T Furuhata, ...
Journal of applied physics 96 (1), 44-48, 2004
512004
Surfactant effect of Sb on GaInAs quantum dots grown by molecular beam epitaxy
T Matsuura, T Miyamoto, T Kageyama, M Ohta, Y Matsui, T Furuhata, ...
Japanese journal of applied physics 43 (5A), L605, 2004
452004
Nitride semiconductor device and method of producing the same
Y Ooshika, T Matsuura
US Patent 8,680,509, 2014
322014
P-type doping characteristics of GaInNAs: Be grown by solid source molecular beam epitaxy
T Matsuura, T Miyamoto, S Makino, M Ohta, Y Matsui, F Koyama
Japanese journal of applied physics 43 (4A), L433, 2004
212004
Elongation of emission wavelength of GaInAsSb-covered (Ga) InAs quantum dots grown by molecular beam epitaxy
T Matsuura, T Miyamoto, T Kageyama, M Ohta, Y Matsui, T Furuhata, ...
Japanese journal of applied physics 43 (1A), L82, 2003
212003
1.4 µm GaInNAs/GaAs quantum well laser grown by chemical beam epitaxy
Y Ikenaga, T Miyamoto, S Makino, T Kageyama, M Arai, F Koyama, K Iga
Japanese journal of applied physics 41 (2R), 664, 2002
172002
Topological characteristics of InAs quantum dot with GaInAs cover using Sb surfactant
T Matsuura, T Miyamoto, F Koyama
Applied physics letters 88 (18), 2006
162006
Photoluminescence characterization of (Ga) InAs quantum dots with GaInAsSb cover layer grown by MBE
T Matsuura, T Miyamoto, M Ohta, F Koyama
physica status solidi c 3 (3), 516-519, 2006
92006
PL characteristics of InAs quantum dots with Sb irradiation in growth interruption
T Matsuura, T Miyamoto, M Ohta, Y Matsui, T Furuhata, F Koyama
Journal of crystal growth 278 (1-4), 51-56, 2005
92005
Semiconductor device
T Fukumoto, M Tokunaga, T Matsuura
US Patent App. 29/150,991, 2002
92002
Stacked semiconductor device structure
T Fukumoto, M Tokunaga, T Matsuura
US Patent App. 09/947,360, 2002
82002
Semiconductor device
T Fukumoto, M Tokunaga, T Matsuura
US Patent App. 29/144,816, 2002
82002
Iii nitride semiconductor light emitting device
T Matsuura
US Patent App. 14/763,044, 2015
72015
Semiconductor device and method of producing the same
Y Ooshika, T Matsuura
US Patent 8,735,938, 2014
72014
Semiconductor device
T Fukumoto, M Tokunaga, T Matsuura
US Patent App. 29/144,821, 2002
72002
Optical quality dependence on growth rate for solid-source molecular beam epitaxy grown highly strained GaInAsSb/GaAs quantum wells
M Ohta, T Miyamoto, T Matsuura, Y Matsui, T Furuhata, F Koyama
Japanese journal of applied physics 43 (12B), L1569, 2004
62004
Photoluminescence characterization of inas quantum dots on GaNAs buffer layer by metalorganic chemical vapor deposition
R Suzuki, T Miyamoto, T Matsuura, F Koyama
Japanese journal of applied physics 45 (6L), L585, 2006
52006
Semiconductor device and method for manufacture thereof
T Matsuura, K Michii, J Shibata, K Bando
US Patent App. 10/628,461, 2004
52004
Semiconductor device
T Fukumoto, M Tokunaga, T Matsuura
US Patent App. 29/144,819, 2002
52002
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