| SU-8: a low-cost negative resist for MEMS H Lorenz, M Despont, N Fahrni, N LaBianca, P Renaud, P Vettiger Journal of Micromechanics and Microengineering 7 (3), 121, 1997 | 1381 | 1997 |
| High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS H Lorenz, M Despont, N Fahrni, J Brugger, P Vettiger, P Renaud Sensors and Actuators A: physical 64 (1), 33-39, 1998 | 780 | 1998 |
| 3D microfabrication by combining microstereolithography and thick resist UV lithography A Bertsch, H Lorenz, P Renaud Sensors and Actuators A: Physical 73 (1-2), 14-23, 1999 | 289 | 1999 |
| Mechanical characterization of a new high-aspect-ratio near UV-photoresist H Lorenz, M Laudon, P Renaud Microelectronic engineering 41, 371-374, 1998 | 289 | 1998 |
| High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications M Despont, H Lorenz, N Fahrni, J Brugger, P Renaud, P Vettiger Proceedings IEEE the tenth annual international workshop on micro electro …, 1997 | 249 | 1997 |
| Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist H Lorenz, M Despont, P Vettiger, P Renaud Microsystem Technologies 4, 143-146, 1998 | 213 | 1998 |
| Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications L Dellmann, S Roth, C Beuret, GA Racine, H Lorenz, M Despont, ... Sensors and Actuators A: Physical 70 (1-2), 42-47, 1998 | 195 | 1998 |
| Combining microstereolithography and thick resist UV lithography for 3D microfabrication A Bertsch, H Lorenz, P Renaud Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro …, 1998 | 106 | 1998 |
| Low-cost technology for multilayer electroplated parts using laminated dry film resist H Lorenz, L Paratte, R Luthier, NF de Rooij, P Renaud Sensors and Actuators A: Physical 53 (1-3), 364-368, 1996 | 75 | 1996 |
| High aspect ratio, 3D structuring of photoresist materials by ion beam LIGA F Munnik, F Benninger, S Mikhailov, A Bertsch, P Renaud, H Lorenz, ... Microelectronic Engineering 67, 96-103, 2003 | 54 | 2003 |
| Two steps micromoulding and photopolymer high-aspect ratio structuring for applications in piezoelectric motor components L Dellmann, S Roth, C Beuret, L Paratte, GA Racine, H Lorenz, ... Microsystem technologies 4, 147-150, 1998 | 49 | 1998 |
| UV-LIGA: From development to commercialization G Genolet, H Lorenz Micromachines 5 (3), 486-495, 2014 | 34 | 2014 |
| Inductive proximity sensor with a flat coil and a new differential relaxation oscillator PA Passeraub, G Rey-Mennet, PA Besse, H Lorenz, RS Popovic Sensors and Actuators A: Physical 60 (1-3), 122-126, 1997 | 24 | 1997 |
| Miniature gear reduction unit driven by a silicon electrostatic wobble motor L Paratte, H Lorenz, R Luthier, R Clavel, IF de Rooij Proceedings IEEE Micro Electro Mechanical Systems An Investigation of Micro …, 1994 | 21 | 1994 |
| New designs for submillimetric press-fitting L Charvier, F Bourgeois, J Jacot, G Genolet, H Lorenz Micro-Assembly Technologies and Applications: IFIP TC5 WG5. 5 Fourth …, 2008 | 1 | 2008 |
| New functionalities for micromechanical watch parts given by LIGA technology design freedom G Genolet, H Lorenz MST NEWS, 16-34, 2004 | 1 | 2004 |
| Review UV-LIGA: From Development to Commercialization G Genolet, H Lorenz | | 2014 |
| Carman, GP, 30 Chen, Q., 30 Cho, Y.-H., 52 B Clasbrummel, JH Daniel, A Desai, M Despont, U Drechsler, D Etzrodt, ... Sensors and Actuators 73, 276, 1999 | | 1999 |
| Nouvelles technologies de microstructuration de type UV-LIGA et fabrication de composants micromécaniques H Lorenz EPFL, 1998 | | 1998 |
| eerses deraser-MICRO ONIC ENGINEERING F Munnik, F Benninger, S Mikhailov, A Bertsch, P Renaud, H Lorenz | | |
