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Simon Ruffell
Simon Ruffell
Applied Materials - Varian Semiconductor Equipment
在 amat.com 的电子邮件经过验证
标题
引用次数
引用次数
年份
Formation and growth of nanoindentation-induced high pressure phases in crystalline and amorphous silicon
S Ruffell, JE Bradby, JS Williams, P Munroe
Journal of Applied Physics 102 (6), 2007
922007
An in situ electrical measurement technique via a conducting diamond tip for nanoindentation in silicon
S Ruffell, JE Bradby, JS Williams, OL Warren
Journal of Materials Research 22 (3), 578-586, 2007
852007
High pressure crystalline phase formation during nanoindentation: amorphous versus crystalline silicon
S Ruffell, JE Bradby, JS Williams
Applied physics letters 89 (9), 2006
782006
Phase transformations induced by spherical indentation in ion-implanted amorphous silicon
B Haberl, JE Bradby, S Ruffell, JS Williams, P Munroe
Journal of applied physics 100 (1), 2006
782006
Identification of nanoindentation-induced phase changes in silicon by in situ electrical characterization
S Ruffell, JE Bradby, N Fujisawa, JS Williams
Journal of Applied Physics 101 (8), 2007
772007
Electron and hole mobility reduction and Hall factor in phosphorus-compensated p-type silicon
FE Rougieux, D Macdonald, A Cuevas, S Ruffell, J Schmidt, B Lim, ...
Journal of Applied Physics 108 (1), 2010
702010
Nanoindentation-induced phase transformations in silicon at elevated temperatures
S Ruffell, JE Bradby, JS Williams, D Munoz-Paniagua, S Tadayyon, ...
Nanotechnology 20 (13), 135603, 2009
692009
Annealing of nanoindentation-induced high pressure crystalline phases created in crystalline and amorphous silicon
S Ruffell, B Haberl, S Koenig, JE Bradby, JS Williams
Journal of Applied Physics 105 (9), 2009
592009
Annealing behavior of low-energy ion-implanted phosphorus in silicon
S Ruffell, IV Mitchell, PJ Simpson
Journal of applied physics 97 (12), 2005
492005
Structural characterization of pressure-induced amorphous silicon
B Haberl, ACY Liu, JE Bradby, S Ruffell, JS Williams, P Munroe
Physical Review B—Condensed Matter and Materials Physics 79 (15), 155209, 2009
472009
Influence of oxygen on the sputtering of aluminum oxide for the surface passivation of crystalline silicon
TTA Li, S Ruffell, M Tucci, Y Mansoulié, C Samundsett, S De Iullis, ...
Solar energy materials and solar cells 95 (1), 69-72, 2011
452011
Nanoindentation-induced phase transformation in crystalline silicon and relaxed amorphous silicon
R Rao, JE Bradby, S Ruffell, JS Williams
Microelectronics journal 38 (6-7), 722-726, 2007
432007
Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films
DK Venkatachalam, JE Bradby, MN Saleh, S Ruffell, RG Elliman
Journal of Applied Physics 110 (4), 2011
422011
Understanding pressure-induced phase-transformation behavior in silicon through in situ electrical probing under cyclic loading conditions
N Fujisawa, S Ruffell, JE Bradby, JS Williams, B Haberl, OL Warren
Journal of Applied Physics 105 (10), 2009
402009
Experimental evidence for semiconducting behavior of Si-XII
S Ruffell, K Sears, AP Knights, JE Bradby, JS Williams
Physical Review B—Condensed Matter and Materials Physics 83 (7), 075316, 2011
392011
Room temperature writing of electrically conductive and insulating zones in silicon by nanoindentation
S Ruffell, K Sears, JE Bradby, JS Williams
Applied Physics Letters 98 (5), 2011
382011
Techniques for forming angled structures for reduced defects in heteroepitaxy of semiconductor films
S Srinivasan, FA Khaja, S Ruffell, J Hautala
US Patent 9,287,123, 2016
352016
Nanoscale characterization of energy generation from piezoelectric thin films
M Bhaskaran, S Sriram, S Ruffell, A Mitchell
Advanced Functional Materials 21 (12), 2251-2257, 2011
342011
Annealing kinetics of nanoindentation-induced polycrystalline high pressure phases in crystalline silicon
S Ruffell, JE Bradby, JS Williams
Applied physics letters 90 (13), 2007
282007
Effects of carbon on ion-implantation-induced disorder in GaN
SO Kucheyev, JE Bradby, CP Li, S Ruffell, T van Buuren, TE Felter
Applied Physics Letters 91 (26), 2007
272007
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