| Molecular pathways for defect annihilation in directed self-assembly SM Hur, V Thapar, A Ramírez-Hernández, G Khaira, T Segal-Peretz, ... Proceedings of the National Academy of Sciences 112 (46), 14144-14149, 2015 | 117 | 2015 |
| Simulation of defect reduction in block copolymer thin films by solvent annealing SM Hur, GS Khaira, A Ramírez-Hernández, M Müller, PF Nealey, ... ACS Macro Letters 4 (1), 11-15, 2015 | 91 | 2015 |
| Turning statistical physics models into materials design engines MZ Miskin, G Khaira, JJ de Pablo, HM Jaeger Proceedings of the National Academy of Sciences 113 (1), 34-39, 2016 | 83 | 2016 |
| Evolutionary optimization of directed self-assembly of triblock copolymers on chemically patterned substrates GS Khaira, J Qin, GP Garner, S Xiong, L Wan, R Ruiz, HM Jaeger, ... ACS Macro Letters 3 (8), 747-752, 2014 | 83 | 2014 |
| Evolutionary pattern design for copolymer directed self-assembly J Qin, GS Khaira, Y Su, GP Garner, M Miskin, HM Jaeger, JJ de Pablo Soft Matter 9 (48), 11467-11472, 2013 | 70 | 2013 |
| Quantitative three-dimensional characterization of block copolymer directed self-assembly on combined chemical and topographical prepatterned templates T Segal-Peretz, J Ren, S Xiong, G Khaira, A Bowen, LE Ocola, R Divan, ... ACS nano 11 (2), 1307-1319, 2017 | 53 | 2017 |
| Derivation of multiple covarying material and process parameters using physics-based modeling of X-ray data G Khaira, M Doxastakis, A Bowen, J Ren, HS Suh, T Segal-Peretz, ... Macromolecules 50 (19), 7783-7793, 2017 | 36 | 2017 |
| Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes JA Torres, K Sakajiri, D Fryer, Y Granik, Y Ma, P Krasnova, G Fenger, ... Design-Process-Technology Co-optimization for Manufacturability VIII 9053 …, 2014 | 20 | 2014 |
| Optimizing self-consistent field theory block copolymer models with X-ray metrology AF Hannon, DF Sunday, A Bowen, G Khaira, J Ren, PF Nealey, ... Molecular systems design & engineering 3 (2), 376-389, 2018 | 15 | 2018 |
| Gaussian random field EUV stochastic models, their generalizations and lithographically meaningful stochastic metrics A Latypov, G Khaira, G Fenger, S Wang, M Chew, S Shang Extreme Ultraviolet (EUV) Lithography XII 11609, 104-119, 2021 | 13 | 2021 |
| Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula A Latypov, G Khaira, G Fenger, J Sturtevant, CI Wei, P De Bisschop Extreme Ultraviolet (EUV) Lithography XI 11323, 140-164, 2020 | 12 | 2020 |
| Directed self assembly (DSA) compliant flow with immersion lithography: from material to design and patterning Y Ma, Y Wang, J Word, J Lei, J Mitra, JA Torres, L Hong, G Fenger, ... Alternative Lithographic Technologies VIII 9777, 117-127, 2016 | 12 | 2016 |
| A comprehensive evaluation of novel AI accelerators for deep learning workloads M Emani, Z Xie, S Raskar, V Sastry, W Arnold, B Wilson, R Thakur, ... 2022 IEEE/ACM international workshop on performance modeling, benchmarking …, 2022 | 10 | 2022 |
| Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing K Yoshimoto, BL Peters, GS Khaira, JJ de Pablo Alternative Lithographic Technologies IV 8323, 568-578, 2012 | 9 | 2012 |
| Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography CI Wei, A Latypov, P De Bisschop, G Khaira, G Fenger Japanese Journal of Applied Physics 61 (SD), SD0806, 2022 | 6 | 2022 |
| Better prediction on patterning failure mode with hotspot aware OPC modeling CI Wei, S Wu, Y Deng, G Khaira, I Kusnadi, G Fenger, S Kang, Y Okamoto, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 5 | 2021 |
| Design technology co-optimization (DTCO) study on self-aligned-Via (SAV) with lamella DSA for sub-7 nm technology Y Ma, J Kye, GS Khaira, L Hong, J Word, Y Sun, J Mitra, JA Torres, ... Design-Process-Technology Co-optimization for Manufacturability XI 10148, 74-85, 2017 | 5 | 2017 |
| Directed self-assembly compliant flow with immersion lithography: from material to design and patterning Y Ma, Y Wang, J Word, J Lei, J Mitra, JA Torres, L Hong, G Fenger, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 031610-031610, 2016 | 5 | 2016 |
| Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process G Khaira, GL Fenger, A Latypov, JL Sturtevant, Y Granik US Patent 11,061,373, 2021 | 4 | 2021 |
| Optimizing directed self-assembled morphology J Qin, GS Khaira, Y Su, GP Garner, M Miskin, HM Jaeger, JJ de Pablo arXiv preprint arXiv:1308.0622, 2013 | 2 | 2013 |
Juan J. de PabloProfessor of Molecular Engineering, University of Chicago在 uchicago.edu 的电子邮件经过验证
