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Wassim Hamouda
Wassim Hamouda
Postdoctoral researcher
在 helmholtz-berlin.de 的电子邮件经过验证
标题
引用次数
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Physical chemistry of the TiN/Hf0. 5Zr0. 5O2 interface
W Hamouda, A Pancotti, C Lubin, L Tortech, C Richter, T Mikolajick, ...
Journal of Applied Physics 127 (6), 2020
1422020
Interface chemistry of pristine TiN/La: Hf0. 5Zr0. 5O2 capacitors
W Hamouda, C Lubin, S Ueda, Y Yamashita, O Renault, F Mehmood, ...
Applied Physics Letters 116 (25), 2020
402020
Oxygen vacancy concentration as a function of cycling and polarization state in TiN/Hf0. 5Zr0. 5O2/TiN ferroelectric capacitors studied by x-ray photoemission electron microscopy
W Hamouda, F Mehmood, T Mikolajick, U Schroeder, TO Mentes, ...
Applied Physics Letters 120 (20), 2022
252022
The Electrode‐Ferroelectric Interface as the Primary Constraint on Endurance and Retention in HZO‐Based Ferroelectric Capacitors
R Alcala, M Materano, PD Lomenzo, P Vishnumurthy, W Hamouda, ...
Advanced Functional Materials 33 (43), 2303261, 2023
242023
Electronic Synapses Enabled by an Epitaxial SrTiO3‐δ / Hf0.5Zr0.5O2 Ferroelectric Field‐Effect Memristor Integrated on Silicon
N Siannas, C Zacharaki, P Tsipas, DJ Kim, W Hamouda, C Istrate, ...
Advanced Functional Materials 34 (8), 2311767, 2024
72024
Surface relaxation and rumpling of Sn-doped
A Pancotti, TC Back, W Hamouda, M Lachheb, C Lubin, P Soukiassian, ...
Physical Review B 102 (24), 245306, 2020
72020
Laboratory-based hard X-ray photoelectron spectroscopy for fundamental and industrial research
T Hashimoto, P Amann, A Regoutz, N Barrett, LF PIPER, W Hamouda, ...
Vacuum and Surface Science 64 (11), 2021
32021
Ferroelectric domain stability in la-doped Hf0. 5Zr0. 5O2 thin films
N Alyabyeva, W Hamouda, C Lubin, F Mehmood, U Schroeder, N Barrett
12nd International Conference on LEEM/PEEM, 2022
12022
Oxygen vacancy engineering in Si-doped, HfO2 ferroelectric capacitors using Ti oxygen scavenging layers
N Barrett, W Hamouda, C Lubin, J Laguerre, C Carabasse, N Vaxelaire, ...
Applied Physics Letters 125 (4), 2024
2024
Operando hard X-ray photoemission characterization of oxygen vacancies and correlation with the performance of ferroelectric, hafnia-based, non-volatile memories
N Barrett, W Hamouda, C Lubin, F Mehmood, U Schroeder, T Mikolajick, ...
APS March Meeting Abstracts 2023, K41. 002, 2023
2023
Characterization of the interface electronic structure of ultra-thin ferroelectric HfxZr1-xO2 films for low power, CMOS-compatible, non-volatile memories
W Hamouda
Université Paris-Saclay, 2022
2022
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