| Surface modification of titanium by radio frequency plasma nitriding FM El-Hossary, NZ Negm, SM Khalil, M Raaif Thin Solid Films 497 (1-2), 196-202, 2006 | 52 | 2006 |
| CO2 laser nitriding of titanium M Raaif, FM El-Hossary, NZ Negm, SM Khalil, A Kolitsch, D Höche, ... Journal of Physics D: Applied Physics 41 (8), 085208, 2008 | 47 | 2008 |
| Tribo-mechanical and electrochemical properties of plasma nitriding titanium FM El-Hossary, NZ Negm, AM Abd El-Rahman, M Raaif, AA Seleem, ... Surface and Coatings Technology 276, 658-667, 2015 | 45 | 2015 |
| Surface treatment of Ti–6Al–4V alloy by rf plasma nitriding M Raaif, FM El-Hossary, NZ Negm, SM Khalil, P Schaaf Journal of Physics: Condensed Matter 19 (39), 396003, 2007 | 42 | 2007 |
| The effect of Cu on the properties of CdO/Cu/CdO multilayer films for transparent conductive electrode applications M Raaif, SH Mohamed Applied Physics A 123, 1-7, 2017 | 27 | 2017 |
| Effect of continuous and cyclic Rf plasma processing time on titanium surface FM El-Hossary, NZ Negm, SM Khalil, M Raaif Applied Surface Science 239 (2), 142-153, 2005 | 24 | 2005 |
| Properties of titanium oxynitride prepared by RF plasma FM El-Hossary, NZ Negm, AM Abd El-Rahman, M Raaif, AA Abd Elmula Advances in Chemical Engineering and Science 5 (01), 1, 2014 | 23 | 2014 |
| Investigating the structure and tribo-mechanical performance of PVD TiN on bearing TiN substrate constructed by rf plasma M Raaif Materials Chemistry and Physics 224, 117-123, 2019 | 21 | 2019 |
| Effects of thickness and rf plasma oxidizing on structural and optical properties of SiOxNy thin films SH Mohamed, M Raaif Surface and Coatings Technology 205 (2), 525-532, 2010 | 20 | 2010 |
| Effect of DC-pulsed magnetron sputtering power on structural, tribological and biocompatibility of Ti–Zr–N thin film FM El-Hossary, AMA El-Rahman, M Raaif, S Qu, J Zhao, MF Maitz, ... Applied Physics A 124, 1-12, 2018 | 19 | 2018 |
| Optical and electrical performance of transparent conductive TiO2/Cu/TiO2 multilayers prepared by magnetron sputtering MA Awad, M Raaif Journal of Materials Science: Materials in Electronics 29, 2815-2824, 2018 | 17 | 2018 |
| Properties of TiAlN coating deposited by MPIIID on TiN substrates FM El-Hossary, AM Abd El-Rahman, M Raaif, DA Ghareeb Applied Physics A 122, 1-11, 2016 | 12 | 2016 |
| Constructing and characterizing TiAlN thin film by DC. Pulsed magnetron sputtering at different nitrogen/argon gas ratios M Raaif JOURNAL OF ADVANCES IN PHYSICS 14 (2), 5638-5652, 2018 | 9 | 2018 |
| Effect of rf plasma carbonitriding on the biocompatibility and mechanical properties of AISI 321 Austenitic stainless steel FM El-Hossary, AM Abd El-Rahman, M Raaif, AA Seleem, MA El-Kassem Advances in Materials Physics and Chemistry 2014, 2014 | 9 | 2014 |
| Effect of annealing temperature on hardness, thickness and phase structure of carbonitrided 304 stainless steel FM El-Hossary, NZ Negm, SM Khalil, AM Abed El-Rahman, M Raaif, ... Applied Physics A 99, 489-495, 2010 | 8 | 2010 |
| Physical, electrochemical, and biocompatibility characteristics of Ti-Al-N thin film synthesized by DC pulsed magnetron sputtering FM El-Hossary, AMA El-Rahman, M Raaif, MA El-Kassem Journal of the Australian Ceramic Society 56, 1155-1165, 2020 | 7 | 2020 |
| Optical Properties of Nanocrystalline/Amorphous TiO 2 Thin Film Deposited by rf Plasma Magnetron Sputtering. AA Abd El-Moula, M Raaif, FM El-Hossary Acta Physica Polonica, A. 137 (6), 2020 | 6 | 2020 |
| Effect of Cu Metallic Interlayer Thickness on Optoelectronic Properties of TiO2-Based Multilayers Deposited by DC Pulsed Magnetron Sputtering AAA El-Moula, FM El-Hossary, M Raaif, A Thabet, MA El-Kassem Journal of Electronic Materials 50, 2699-2709, 2021 | 5 | 2021 |
| Properties of~ Rf Plasma Nitrided Silicon Thin Films at Different Rf Plasma Processing Powers S Mohamed, M Raaif, A Abd El-Rahman, E Shaaban Acta Physica Polonica A 120 (3), 552-557, 2011 | 5 | 2011 |
| Influence of rf-power on the plasma carbonitriding of titanium M Raaif, FM El-Hossary, NZ Negm, SM Khalil, P Schaaf Materials Science and Engineering: A 480 (1-2), 271-277, 2008 | 5 | 2008 |
