Flexible graphene electrode-based organic photovoltaics with record-high efficiency H Park, S Chang, X Zhou, J Kong, T Palacios, S Gradečak Nano Letters 14 (9), 5148-5154, 2014 | 252 | 2014 |
A review of MBE grown 0D, 1D and 2D quantum structures in a nanowire M De La Mata, X Zhou, F Furtmayr, J Teubert, S Gradečak, M Eickhoff, ... Journal of Materials Chemistry C 1 (28), 4300-4312, 2013 | 92 | 2013 |
Nanoscale optical properties of indium gallium nitride/gallium nitride nanodisk-in-rod heterostructures X Zhou, MY Lu, YJ Lu, EJ Jones, S Gwo, S Gradecak ACS nano 9 (3), 2868-2875, 2015 | 59 | 2015 |
Role of Au in the growth and nanoscale optical properties of ZnO nanowires MM Brewster, X Zhou, SK Lim, S Gradečak The Journal of Physical Chemistry Letters 2 (6), 586-591, 2011 | 54 | 2011 |
The Growth and Optical Properties of ZnO Nanowalls MM Brewster, MY Lu, SK Lim, MJ Smith, X Zhou, S Gradečak The Journal of Physical Chemistry Letters 2 (15), 1940-1945, 2011 | 44 | 2011 |
Using seed particle composition to control structural and optical properties of GaN nanowires X Zhou, J Chesin, S Crawford, S Gradečak Nanotechnology 23 (28), 285603, 2012 | 40 | 2012 |
The interplay of structural and optical properties in individual ZnO nanostructures MM Brewster, X Zhou, MY Lu, S Gradečak Nanoscale 4 (5), 1455-1462, 2012 | 35 | 2012 |
Atomic layer deposition and etch in a single plasma chamber for critical dimension control X Zhou, Y Kimura, D Zhang, C Xu, G Upadhyaya, M Brooks US Patent 10,734,238, 2020 | 16 | 2020 |
Light extraction in individual GaN nanowires on Si for LEDs J Chesin, X Zhou, S Gradečak Nanoepitaxy: Materials and Devices IV 8467, 11-20, 2012 | 16 | 2012 |
From GaN to ZnGa2O4 through a Low-Temperature Process: Nanotube and Heterostructure Arrays MY Lu, X Zhou, CY Chiu, S Crawford, S Gradecak ACS Applied Materials & Interfaces 6 (2), 882-887, 2014 | 13 | 2014 |
Correlation of doping, structure, and carrier dynamics in a single GaN nanorod X Zhou, MY Lu, YJ Lu, S Gwo, S Gradečak Applied Physics Letters 102 (25), 2013 | 13 | 2013 |
Atomic layer deposition and etch for reducing roughness X Zhou, N Ansari, Y Kimura, SYY Li, K Sultana, R Mani, D Zhang, H Kazi, ... US Patent 10,658,174, 2020 | 10 | 2020 |
Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation X Zhou, G Upadhyaya, Y Kimura, W Zhu, Z Han, S Lee, N Sun US Patent 10,515,815, 2019 | 9 | 2019 |
Flexible graphene electrode-based organic photovoltaics with record-high efficiency H Park, S Chang, X Zhou, J Kong, T Palacios, S Gradecak ECS Transactions 69 (14), 77, 2015 | 3 | 2015 |
Reducing roughness of extreme ultraviolet lithography resists X Zhou, TH Goh, Y Kimura US Patent App. 17/593,371, 2022 | 2 | 2022 |
Integrated atomic layer passivation in TCP etch chamber and in-situ etch-ALP method X Zhou, TA Kamp, Y Kimura, D Zhang, C Xu, J Drewery, A Paterson US Patent 10,950,454, 2021 | 2 | 2021 |
Atomic layer deposition and etch in a single plasma chamber for critical dimension control X Zhou, Y Kimura, D Zhang, C Xu, G Upadhyaya, M Brooks US Patent 11,211,253, 2021 | 1 | 2021 |
Synchronization of rf generators Y Wu, JS Drewery, AM Paterson, X Zhou, Z Wang, Y Kimura US Patent App. 18/012,212, 2023 | | 2023 |
Atomic layer deposition and etch for reducing roughness X Zhou, N Ansari, Y Kimura, SYY Li, K Sultana, R Mani, D Zhang, H Kazi, ... US Patent 11,170,997, 2021 | | 2021 |
Integrated atomic layer passivation in tcp etch chamber and in-situ etch-alp method X Zhou, TA Kamp, Y Kimura, D Zhang, C Xu, J Drewery, A Paterson US Patent App. 17/200,526, 2021 | | 2021 |