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JAE-SEOK YANG
JAE-SEOK YANG
Samsung Semiconductor R&D Center
在 cadence.com 的电子邮件经过验证
标题
引用次数
引用次数
年份
Double patterning layout decomposition for simultaneous conflict and stitch minimization
K Yuan, JS Yang, D Pan
Proceedings of the 2009 international symposium on Physical design, 107-114, 2009
1562009
TSV stress aware timing analysis with applications to 3D-IC layout optimization
J Yang, K Athikulwongse, YJ Lee, SK Lim, DZ Pan
Proceedings of the 47th Design Automation Conference, 803-806, 2010
1462010
Stress-driven 3D-IC placement with TSV keep-out zone and regularity study
K Athikulwongse, A Chakraborty, JS Yang, DZ Pan, SK Lim
2010 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 669-674, 2010
1282010
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography
JS Yang, K Lu, M Cho, K Yuan, DZ Pan
2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC), 637-644, 2010
832010
Overlay aware interconnect and timing variation modeling for double patterning technology
JS Yang, DZ Pan
2008 IEEE/ACM International Conference on Computer-Aided Design, 488-493, 2008
502008
Design for manufacturability and reliability for TSV-based 3D ICs
DZ Pan, SK Lim, K Athikulwongse, M Jung, J Mitra, J Pak, M Pathak, ...
17th Asia and South Pacific Design Automation Conference, 750-755, 2012
402012
Robust clock tree synthesis with timing yield optimization for 3D-ICs
JS Yang, J Pak, X Zhao, SK Lim, DZ Pan
16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011), 621-626, 2011
352011
Dealing with IC manufacturability in extreme scaling
B Yu, JR Gao, D Ding, Y Ban, J Yang, K Yuan, M Cho, DZ Pan
Proceedings of the International Conference on Computer-Aided Design, 240-242, 2012
312012
Integrated circuit devices and method of manufacturing the same
S Rastogi, S Kuchanuri, R Azmat, P Park, CH Park, JS Yang, KY Chun
US Patent 10,361,198, 2019
232019
Impact of mechanical stress on the full chip timing for through-silicon-via-based 3-D ICs
K Athikulwongse, JS Yang, DZ Pan, SK Lim
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2013
232013
Semiconductor devices and methods of manufacturing the same
HJ Kim, CH Kim, JUN Hwi-Chan, CH Park, JS Yang, KY Chun
US Patent 10,177,093, 2019
222019
Layout method and semiconductor device
IW OH, JS Yang, JH Lee, HJ Lee, SW Hwang
US Patent App. 15/372,840, 2017
172017
Layout optimizations for double patterning lithography
DZ Pan, JS Yang, K Yuan, M Cho, Y Ban
2009 IEEE 8th International Conference on ASIC, 726-729, 2009
162009
CAD for double patterning lithography
DZ Pan, JS Yang, K Yuan, M Cho
2010 IEEE International Conference on Integrated Circuit Design and …, 2010
92010
Semiconductor device and method of manufacturing the same
Y Kim, JS Yang, HW Lee
US Patent App. 16/270,214, 2020
82020
Integrated circuit (IC) devices including cross gate contacts
R Ranjan, D Sharma, S Kuchanuri, CH Park, JS Yang, KY Chun
US Patent 10,546,855, 2020
82020
Integrated circuit including standard cell and method of fabricating the integrated circuit
R Azmat, S Rastogi, CH Park, JS Yang, KY Chun
US Patent 11,461,521, 2022
72022
Semiconductor device, method of designing a layout of a semiconductor device, and method of manufacturing a semiconductor device
S Rastogi, S Kuchanuri, CH Park, JS Yang
US Patent 10,474,783, 2019
72019
Methods of fabricating a semiconductor device
I Oh, H Lee, J Yang
US Patent 9,871,122, 2018
72018
Elimination of false aggressors using the functional relationship for full-chip crosstalk analysis
JS Yang, JY Kim, JH Choi, MH Yoo, JT Kong
Fourth International Symposium on Quality Electronic Design, 2003 …, 2003
72003
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