| Self-healing of capacitors with metallized film technology:: experimental observations and theoretical model JH Tortai, A Denat, N Bonifaci Journal of Electrostatics 53 (2), 159-169, 2001 | 124 | 2001 |
| Diagnostic of the self-healing of metallized polypropylene film by modeling of the broadening emission lines of aluminum emitted by plasma discharge JH Tortai, N Bonifaci, A Denat, C Trassy Journal of Applied Physics 97 (5), 2005 | 108 | 2005 |
| Core double–shell cobalt/graphene/polystyrene magnetic nanocomposites synthesized by in situ sonochemical polymerization V Hermán, H Takacs, F Duclairoir, O Renault, JH Tortai, B Viala RSC Advances 5 (63), 51371-51381, 2015 | 89 | 2015 |
| Influence of pattern density in nanoimprint lithography C Gourgon, C Perret, G Micouin, F Lazzarino, JH Tortai, O Joubert, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 86 | 2003 |
| CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns G Gay, T Baron, C Agraffeil, B Salhi, T Chevolleau, G Cunge, H Grampeix, ... Nanotechnology 21 (43), 435301, 2010 | 42 | 2010 |
| Line edge roughness characterization with a three-dimensional atomic force microscope: Transfer during gate patterning processes J Thiault, J Foucher, JH Tortai, O Joubert, S Landis, S Pauliac Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 41 | 2005 |
| Self-healing of metallized polymer films of different nature B Walgenwitz, JH Tortai, N Bonifaci, A Denat Proceedings of the 2004 IEEE International Conference on Solid Dielectrics …, 2004 | 38 | 2004 |
| Epoxy silsesquioxane resists for UV nanoimprint lithography J De Girolamo, M Chouiki, JH Tortai, C Sourd, S Derrough, M Zelsmann, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 25 | 2008 |
| Overcoming pattern collapse of ultra high resolution dense lines obtained with EUV resists A Jouve, J Simon, J Foucher, T David, JH Tortai, H Solak Advances in Resist Technology and Processing XXII 5753, 720-731, 2005 | 24 | 2005 |
| Overcoming pattern collapse on e-beam and EUV lithography A Jouve, J Simon, A Pikon, H Solak, C Vannuffel, JH Tortai Advances in Resist Technology and Processing XXIII 6153, 456-466, 2006 | 22 | 2006 |
| Insulating properties of some liquids after an electrical arc JH Tortai, N Bonifaci, A Denat IEEE transactions on dielectrics and electrical insulation 9 (1), 3-9, 2002 | 19 | 2002 |
| Influence of residual solvent in polymers patterned by nanoimprint lithography C Gourgon, JH Tortai, F Lazzarino, C Perret, G Micouin, O Joubert, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 18 | 2004 |
| Thickness-dependent glass transition temperature of thin resist films for high resolution lithography S Marceau, JH Tortai, J Tillier, N Vourdas, E Gogolides, I Raptis, ... Microelectronic engineering 83 (4-9), 1073-1077, 2006 | 16 | 2006 |
| Multiwavelength interferometry and competing optical methods for the thermal probing of thin polymeric films N Vourdas, G Karadimos, D Goustouridis, E Gogolides, AG Boudouvis, ... Journal of applied polymer science 102 (5), 4764-4774, 2006 | 15 | 2006 |
| An inverse ellipsometric problem for thin film characterization: comparison of different optimization methods A Akbalık, S Soulan, JH Tortai, D Fuard, I Kone, J Hazart, P Schiavone Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 14 | 2009 |
| Modeling of ultra thin resist film structure after spin-coating and post-application bake JH Tortai Microelectronic engineering 73, 223-227, 2004 | 13 | 2004 |
| Near-Zero Negative Real Permittivity in Far Ultraviolet: Extending Plasmonics and Photonics with B1-MoNx S Kassavetis, BD Ozsdolay, N Kalfagiannis, A Habib, JH Tortai, ... The Journal of Physical Chemistry C 123 (34), 21120-21129, 2019 | 10 | 2019 |
| Sensitivity analysis for accurate determination of PSF parameters T Figueiro, JH Tortai, P Schiavone Microelectronic Engineering 97, 77-80, 2012 | 10 | 2012 |
| Geometry impact on ultrahigh resolution pattern collapse A Jouve, J Simon, L Gonon, JH Tortai Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 10 | 2007 |
| Influence of PEN thermal properties on flexible film patterned by nanoimprint lithography C Gourgon, G Philippot, S Labau, JH Tortai, M Benwadih, J Bablet Microelectronic engineering 88 (8), 1959-1963, 2011 | 9 | 2011 |
Bernard VialaCEA在 cea.fr 的电子邮件经过验证
