| Atomic layer deposition of molybdenum oxide from (NtBu) 2 (NMe2) 2Mo and O2 plasma MFJ Vos, B Macco, NFW Thissen, AA Bol, WMM Kessels Journal of Vacuum Science & Technology A 34 (1), 2016 | 146 | 2016 |
| Low‐temperature atomic layer deposition of MoOx for silicon heterojunction solar cells B Macco, MFJ Vos, NFW Thissen, AA Bol, WMM Kessels physica status solidi (RRL)–Rapid Research Letters 9 (7), 393-396, 2015 | 118 | 2015 |
| Area-selective deposition of ruthenium by combining atomic layer deposition and selective etching MFJ Vos, SN Chopra, MA Verheijen, JG Ekerdt, S Agarwal, WMM Kessels, ... Chemistry of Materials 31 (11), 3878-3882, 2019 | 105 | 2019 |
| Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant MFJ Vos, G van Straaten, WMME Kessels, AJM Mackus The Journal of Physical Chemistry C 122 (39), 22519-22529, 2018 | 46 | 2018 |
| Concepts and prospects of passivating contacts for crystalline silicon solar cells J Melskens, BWH van de Loo, B Macco, MFJ Vos, J Palmans, S Smit, ... 2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC), 1-6, 2015 | 31 | 2015 |
| WMM (Erwin) Kessels MFJ Vos, B Macco, NFW Thissen, AA Bol J. Vac. Sci. Technol., A 34, 01A103, 2016 | 26 | 2016 |
| Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma MFJ Vos, HCM Knoops, RA Synowicki, WMM Kessels, AJM Mackus Applied Physics Letters 111 (11), 2017 | 21 | 2017 |
| Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al (CH3) 3 NJ Chittock, MFJ Vos, T Faraz, WMM Kessels, H Knoops, AJM Mackus Applied Physics Letters 117 (16), 2020 | 18 | 2020 |
| Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation SN Chopra, MFJ Vos, MA Verheijen, JG Ekerdt, WMM Kessels, ... Journal of Vacuum Science & Technology A 38 (6), 2020 | 11 | 2020 |
| Plasma-enhanced atomic layer deposition of cobalt and cobalt nitride: what controls the incorporation of nitrogen? G van Straaten, R Deckers, MFJ Vos, WMM Kessels, M Creatore The Journal of Physical Chemistry C 124 (40), 22046-22054, 2020 | 11 | 2020 |
| Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design MFJ Vos, SN Chopra, JG Ekerdt, S Agarwal, WMM Kessels, AJM Mackus Journal of Vacuum Science & Technology A 39 (3), 2021 | 9 | 2021 |
| Atomic-Layer Deposition Process Development-10 steps to successfully develop, optimize and characterize ALD recipes MFJ Vos EPFL: Swiss Federal Institute of Technology Lausanne, 2019 | 9 | 2019 |
| Influence of magnetic configuration on edge turbulence and transport in the H-1 Heliac CA Michael, F Zhao, B Blackwell, MFJ Vos, J Brotankova, SR Haskey, ... Plasma Physics and Controlled Fusion 59 (2), 024001, 2016 | 5 | 2016 |
| Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma MFJ Vos, HCM Knoops, WMM Kessels, AJM Mackus The Journal of Physical Chemistry C 125 (7), 3913-3923, 2021 | 4 | 2021 |
| Development and understanding of advanced atomic layer deposition processes: AlF3, Co, and Ru MFJ Vos | 1 | 2019 |
| Isotropic plasma atomic layer etching of Al NJ Chittock, MFJ Vos, T Faraz, WMME Kessels, HCM Knoops, ... Journal of Vacuum Science & Technology A 33, 020802, 2015 | 1 | 2015 |
| Reaction Mechanisms during Atomic Layer Deposition of AlF₃ Using Al (CH₃) ₃ and SF₆ Plasma MFJ Vos, H Knoops, WMM Kessels, AJM Mackus | | 2021 |
| Een nieuwe atoomlaagdepositieproces voor efficiëntere zonnecellen MFJ Vos, B Macco, WMM Kessels Nevac Blad 5 (1), 8-13, 2016 | | 2016 |
| Atomic layer deposition of molybdenum oxide from (N {sup t} Bu){sub 2}(NMe {sub 2}){sub 2} Mo and O {sub 2} plasma MFJ Vos, B Macco, NFW Thissen, AA Bol, WMM Kessels Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films 34 (1), 2016 | | 2016 |
| Atomic layer deposition of molybdenum oxide MFJ Vos | | 2015 |
