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Yi Han
Yi Han
在 fz-juelich.de 的电子邮件经过验证
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引用次数
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年份
Artificial synapses based on ferroelectric Schottky barrier field-effect transistors for neuromorphic applications
F Xi, Y Han, M Liu, JH Bae, A Tiedemann, D Grützmacher, QT Zhao
ACS applied materials & interfaces 13 (27), 32005-32012, 2021
472021
Structural properties of GeSn thin films grown by molecular beam epitaxy
ZP Zhang, YX Song, ZYS Zhu, Y Han, QM Chen, YY Li, LY Zhang, ...
AIP Advances 7 (4), 2017
172017
Effect of thermal annealing on structural properties of GeSn thin films grown by molecular beam epitaxy
ZP Zhang, YX Song, YY Li, XY Wu, ZYS Zhu, Y Han, LY Zhang, H Huang, ...
AIP Advances 7 (10), 2017
162017
Steep switching Si nanowire p-FETs with dopant segregated silicide source/drain at cryogenic temperature
Y Han, J Sun, B Richstein, F Allibert, I Radu, JH Bae, D Grützmacher, ...
IEEE Electron Device Letters 43 (8), 1187-1190, 2022
142022
Vertical GeSn nanowire MOSFETs for CMOS beyond silicon
M Liu, Y Junk, Y Han, D Yang, JH Bae, M Frauenrath, JM Hartmann, ...
Communications Engineering 2 (1), 7, 2023
132023
Interface engineering for steep slope cryogenic MOSFETs
B Richstein, Y Han, Q Zhao, L Hellmich, J Klos, S Scholz, LR Schreiber, ...
IEEE Electron Device Letters 43 (12), 2149-2152, 2022
102022
Vapor-solid-solid grown Ge nanowires at integrated circuit compatible temperature by molecular beam epitaxy
Z Zhu, Y Song, Z Zhang, H Sun, Y Han, Y Li, L Zhang, Z Xue, Z Di, ...
Journal of Applied Physics 122 (9), 2017
102017
Characterization of fully silicided source/drain SOI UTBB nMOSFETs at cryogenic temperatures
Y Han, F Xi, F Allibert, I Radu, S Prucnal, JH Bae, S Hoffmann-Eifert, ...
Solid-State Electronics 192, 108263, 2022
92022
Cryogenic characteristics of UTBB SOI Schottky-barrier MOSFETs
Y Han, J Sun, F Xi, JH Bae, D Grützmacher, QT Zhao
Solid-State Electronics 194, 108351, 2022
72022
Abnormal strain in suspended GeSn microstructures
Y Han, Y Song, X Chen, Z Zhang, J Liu, Y Li, Z Zhu, H Huang, J Shao, ...
Materials Research Express 5 (3), 035901, 2018
62018
Heterosynaptic Plasticity and Neuromorphic Boolean Logic Enabled by Ferroelectric Polarization Modulated Schottky Diodes
F Xi, A Grenmyr, J Zhang, Y Han, JH Bae, D Grützmacher, QT Zhao
Advanced Electronic Materials 9 (3), 2201155, 2023
52023
A comparative study of selective dry and wet etching of germanium–tin (Ge1− xSnx) on germanium
Y Han, Y Li, Y Song, C Chi, Z Zhang, J Liu, Z Zhu, S Wang
Semiconductor Science and Technology 33 (8), 085011, 2018
52018
Compact modeling of Schottky barrier field-effect transistors at deep cryogenic temperatures
C Roemer, N Dersch, G Darbandy, M Schwarz, Y Han, QT Zhao, ...
Solid-State Electronics 207, 108686, 2023
42023
Toward Low‐Power Cryogenic Metal‐Oxide Semiconductor Field‐Effect Transistors
J Knoch, B Richstein, Y Han, M Frentzen, L Rainer Schreiber, J Klos, ...
physica status solidi (a) 220 (13), 2300069, 2023
42023
GeSn/Ge dual-nanowire heterostructure
Z Zhu, Y Song, Y Han, Y Li, Z Zhang, L Zhang, S Wang
2017 IEEE Photonics Society Summer Topical Meeting Series (SUM), 71-72, 2017
42017
High Performance 5 nm Si Nanowire FETs with a Record Small SS= 2.3 mV/dec and High Transconductance at 5.5 K Enabled by Dopant Segregated Silicide Source/Drain
Y Han, J Sun, JH Bae, D Grützmacher, J Knoch, QT Zhao
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2023
32023
Four-Terminal Ferroelectric Schottky Barrier Field Effect Transistors as Artificial Synapses for Neuromorphic Applications
F Xi, Y Han, A Grenmyr, D Grützmacher, QT Zhao
IEEE Journal of the Electron Devices Society 10, 569-574, 2022
32022
4-terminal ferroelectric Schottky barrier field effect transistors as artificial synapses
F Xi, Y Han, A Tiedemann, D Grützmacher, QT Zhao
ESSDERC 2021-IEEE 51st European Solid-State Device Research Conference …, 2021
32021
Impact of the backgate on the Performance of SOI UTBB nMOSFETs at cryogenic temperatures
Y Han, F Xi, F Allibert, I Radu, S Prucnal, JH Bae, S Hoffmann-Eifert, ...
2021 Joint International EUROSOI Workshop and International Conference on …, 2021
32021
Improved performance of FDSOI FETs at cryogenic temperatures by optimizing ion implantation into silicide
Y Han, J Sun, I Radu, J Knoch, D Grützmacher, QT Zhao
Solid-State Electronics 208, 108733, 2023
22023
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