| Unveiling the double-well energy landscape in a ferroelectric layer M Hoffmann, FPG Fengler, M Herzig, T Mittmann, B Max, U Schroeder, ... Nature 565 (7740), 464-467, 2019 | 371 | 2019 |
| Origin of Ferroelectric Phase in Undoped HfO2 Films Deposited by Sputtering T Mittmann, M Materano, PD Lomenzo, MH Park, I Stolichnov, M Cavalieri, ... Advanced Materials Interfaces 6 (11), 1900042, 2019 | 177 | 2019 |
| Review of defect chemistry in fluorite-structure ferroelectrics for future electronic devices MH Park, DH Lee, K Yang, JY Park, GT Yu, HW Park, M Materano, ... Journal of Materials Chemistry C 8 (31), 10526-10550, 2020 | 122 | 2020 |
| Demonstration of High-speed Hysteresis-free Negative Capacitance in Ferroelectric Hf0.5Zr0.5O2 M Hoffmann, B Max, T Mittmann, U Schroeder, S Slesazeck, T Mikolajick 2018 IEEE International Electron Devices Meeting (IEDM), 31.6. 1-31.6. 4, 2018 | 114 | 2018 |
| Optimizing process conditions for improved Hf1− xZrxO2 ferroelectric capacitor performance T Mittmann, FPG Fengler, C Richter, MH Park, T Mikolajick, U Schroeder Microelectronic Engineering 178, 48-51, 2017 | 102 | 2017 |
| Many routes to ferroelectric HfO2: A review of current deposition methods HA Hsain, Y Lee, M Materano, T Mittmann, A Payne, T Mikolajick, ... Journal of Vacuum Science & Technology A 40 (1), 2022 | 86 | 2022 |
| Influence of Oxygen Content on the Structure and Reliability of Ferroelectric HfxZr1–xO2 Layers M Materano, T Mittmann, PD Lomenzo, C Zhou, JL Jones, M Falkowski, ... ACS applied electronic materials 2 (11), 3618-3626, 2020 | 79 | 2020 |
| Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors P Buragohain, A Erickson, P Kariuki, T Mittmann, C Richter, PD Lomenzo, ... ACS applied materials & interfaces 11 (38), 35115-35121, 2019 | 79 | 2019 |
| Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium U Schroeder, M Materano, T Mittmann, PD Lomenzo, T Mikolajick, ... Japanese Journal of Applied Physics 58 (SL), SL0801, 2019 | 71 | 2019 |
| Impact of vacancies and impurities on ferroelectricity in PVD-and ALD-grown HfO2 films L Baumgarten, T Szyjka, T Mittmann, M Materano, Y Matveyev, ... Applied Physics Letters 118 (3), 2021 | 57 | 2021 |
| Impact of oxygen vacancy content in ferroelectric HZO films on the device performance T Mittmann, M Materano, SC Chang, I Karpov, T Mikolajick, U Schroeder 2020 IEEE International Electron Devices Meeting (IEDM), 18.4. 1-18.4. 4, 2020 | 53 | 2020 |
| Genuinely Ferroelectric Sub-1-Volt-Switchable Nanodomains in HfxZr(1–x)O2 Ultrathin Capacitors I Stolichnov, M Cavalieri, E Colla, T Schenk, T Mittmann, T Mikolajick, ... ACS applied materials & interfaces 10 (36), 30514-30521, 2018 | 47 | 2018 |
| Stabilizing the ferroelectric phase in HfO 2-based films sputtered from ceramic targets under ambient oxygen T Mittmann, M Michailow, PD Lomenzo, J Gärtner, M Falkowski, A Kersch, ... Nanoscale 13 (2), 912-921, 2021 | 44 | 2021 |
| Enhanced Ferroelectric Polarization in TiN/HfO2/TiN Capacitors by Interface Design T Szyjka, L Baumgarten, T Mittmann, Y Matveyev, C Schlueter, ... ACS Applied Electronic Materials 2 (10), 3152-3159, 2020 | 41 | 2020 |
| Impact of Iridium Oxide Electrodes on the Ferroelectric Phase of Thin Hf0.5Zr0.5O2 Films T Mittmann, T Szyjka, H Alex, MC Istrate, PD Lomenzo, L Baumgarten, ... physica status solidi (RRL)–Rapid Research Letters 15 (5), 2100012, 2021 | 35 | 2021 |
| A silicon nanowire ferroelectric field‐effect transistor V Sessi, M Simon, H Mulaosmanovic, D Pohl, M Loeffler, T Mauersberger, ... Advanced Electronic Materials 6 (4), 1901244, 2020 | 35 | 2020 |
| Next generation ferroelectric memories enabled by hafnium oxide T Mikolajick, U Schroeder, PD Lomenzo, ET Breyer, H Mulaosmanovic, ... 2019 IEEE International Electron Devices Meeting (IEDM), 15.5. 1-15.5. 4, 2019 | 35 | 2019 |
| Temperature‐Dependent Phase Transitions in HfxZr1‐xO2 Mixed Oxides: Indications of a Proper Ferroelectric Material U Schroeder, T Mittmann, M Materano, PD Lomenzo, P Edgington, ... Advanced Electronic Materials 8 (9), 2200265, 2022 | 31 | 2022 |
| Harnessing Phase Transitions in Antiferroelectric ZrO2 Using the Size Effect PD Lomenzo, M Materano, T Mittmann, P Buragohain, A Gruverman, ... Advanced Electronic Materials 8 (1), 2100556, 2022 | 28 | 2022 |
| Control of unintentional oxygen incorporation in GaN S Schmult, F Schubert, S Wirth, A Großer, T Mittmann, T Mikolajick Journal of Vacuum Science & Technology B 35 (2), 2017 | 16 | 2017 |
