| Effect of reactive gases flow ratios on the microstructure and electrical resistivity of Ta–N–O thin films by reactive co-sputtering CK Chung, TS Chen, NW Chang Thin Solid Films 519 (15), 5099-5102, 2011 | 25 | 2011 |
| Grain boundary scattering for temperature coefficient of resistance (TCR) behaviour of Ta–Si–N thin films CK Chung, A Nautiyal, TS Chen, YL Chang Journal of Physics D: Applied Physics 41 (18), 185404, 2008 | 21 | 2008 |
| Thermal spray coating of Al-Cu-Fe quasicrystals: Dynamic observations and surface properties H Parsamehr, TS Chen, DS Wang, MS Leu, I Han, Z Xi, AP Tsai, ... Materialia 8, 100432, 2019 | 19 | 2019 |
| Effect of microstructures on the electrical and optoelectronic properties of nanocrystalline Ta–Si–N thin films by reactive magnetron cosputtering CK Chung, TS Chen Scripta materialia 57 (7), 611-614, 2007 | 18 | 2007 |
| Thermal stability of Ta–Si–N nanocomposite thin films at different nitrogen flow ratios CK Chung, TS Chen, CC Peng, BH Wu Surface and Coatings Technology 201 (7), 3947-3952, 2006 | 18 | 2006 |
| Oxidation resistance and mechanical property of cosputtered quasi-amorphous Ta–Si–N films under vacuum rapid thermal annealing CK Chung, TS Chen, NW Chang, SC Chang, MW Liao Surface and Coatings Technology 205 (5), 1268-1272, 2010 | 15 | 2010 |
| Effect of Si/Ta and nitrogen ratios on the thermal stability of Ta–Si–N thin films CK Chung, TS Chen Microelectronic engineering 87 (2), 129-134, 2010 | 13 | 2010 |
| Preparation and nanoscopic plastic deformation of toughened Al-Cu-Fe-based quasicrystal/vanadium multilayered coatings SY Chang, BJ Chen, YT Hsiao, DS Wang, TS Chen, MS Leu, HJ Lai Materials Chemistry and Physics 213, 277-284, 2018 | 12 | 2018 |
| Effect of nitrogen flow ratios on the microstructure and properties of Ta–Al–N thin films by reactive cosputtering CK Chung, TS Chen Journal of the Electrochemical Society 156 (2), H119, 2008 | 10 | 2008 |
| Annealing effects on microstructure and properties of Ta–Al thin film resistors CK Chung, YL Chang, TS Chen, PJ Su Surface and Coatings Technology 201 (7), 4195-4200, 2006 | 10 | 2006 |
| Characterization and patterning of novel high-TCR Ta–Si–N thin films for sensor application CK Chung, YL Chang, JC Wu, JJ Jhu, TS Chen Sensors and Actuators A: Physical 156 (2), 323-327, 2009 | 9 | 2009 |
| Stress writing textured graphite conducting wires/patterns in insulating amorphous carbon matrix as interconnects DS Wang, SY Chang, TS Chen, TH Chou, YC Huang, JB Wu, MS Leu, ... Scientific Reports 7 (1), 9727, 2017 | 8 | 2017 |
| Effect of the target shuttering on the characteristics of the Ta–Si–N thin films by reactive magnetron co-sputtering CK Chung, TS Chen, A Nautiyal, NW Chang, ST Hung Surface and Coatings Technology 204 (6-7), 1071-1075, 2009 | 8 | 2009 |
| Effect of nitrogen flow ratio on the microstructure evolution and nanoindented mechanical property of the Ta–Si–N thin films CK Chung, TS Chen Journal of Materials Research 23 (2), 494-499, 2008 | 8 | 2008 |
| Metal/polymer composite material and method for fabricating the same HJ Lai, MS Leu, TS Chen, WT Hsiao US Patent 10,195,816, 2019 | 4 | 2019 |
| Synthesis and characteristics of nanostructured silicon-rich nitride thin films using modified long-wavelength CO2 laser annealing CK Chung, CH Li, TS Chen Laser Physics Letters 12 (9), 096003, 2015 | 3 | 2015 |
| Effect of annealing temperature on the microstructure and photoluminescence of low resistivity Si/SiN/TaN thin films using magnetron sputtering CK Chung, TS Chen, NW Chang, MW Liao, CT Lee Thin solid films 520 (5), 1460-1463, 2011 | 3 | 2011 |
| A new visible photoluminescence in the conducting Ta–Si–N nanocomposite thin films CK Chung, TS Chen Journal of luminescence 129 (4), 370-375, 2009 | 3 | 2009 |
| Structure of thermoelectric film MS Leu, TS Chen, CC Shih US Patent 9,166,137, 2015 | 1 | 2015 |
| Fabrication and characterization of nanostructured Ta-Si-N films CK Chung, TS Chen, CC Peng, BH Wu 2007 2nd IEEE International Conference on Nano/Micro Engineered and …, 2007 | 1 | 2007 |
