| Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO2 Thin Films Using TiCl4 and H2O Precursors: Correlation Between … W Chiappim, GE Testoni, JSB De Lima, HS Medeiros, RS Pessoa, ... Brazilian journal of physics 46, 56-69, 2016 | 45 | 2016 |
| Effect of nitrogen content in amorphous SiCxNyOz thin films deposited by low temperature reactive magnetron co-sputtering technique HS Medeiros, RS Pessoa, JC Sagás, MA Fraga, LV Santos, HS Maciel, ... Surface and Coatings Technology 206 (7), 1787-1795, 2011 | 29 | 2011 |
| Microwave air plasma applied to naphthalene thermal conversion HS Medeiros, A Pilatau, OS Nozhenko, AS Da Silva Sobrinho, ... Energy & Fuels 30 (2), 1510-1516, 2016 | 20 | 2016 |
| Evaluation Criteria for the Assessment of the Influence of Additives (AlCl3 and ZnCl2) on Pyrolysis of Sunflower Oil Cake A Pilatau, KM Czajka, G Petraconi Filho, HS Medeiros, AM Kisiela Waste and Biomass Valorization 8, 2595-2607, 2017 | 10 | 2017 |
| SixCy Thin Films Deposited at Low Temperature by DC Dual Magnetron Sputtering: Effect of Power Supplied to Si and C Cathode Targets on Film … HS Medeiros, RS Pessoa, JC Sagás, MA Fraga, LV Santos, HS Maciel, ... Materials Science Forum 717, 197-201, 2012 | 10 | 2012 |
| Amorphous silicon carbide thin films deposited by magnetron co-sputtering: Effect of applied power and deposition pressure on film characteristics HS Medeiros, RS Pessoa, HS Maciel, M Massi, LL Tezani, G Leal, ... ECS Transactions 49 (1), 375, 2012 | 6 | 2012 |
| Low-pressure deposition techniques of silicon carbide thin films: An overview RS Pessoa, HS Medeiros, MA Fraga, NKM Galvao, JC Sagas, HS Maciel, ... Materials Science Research Journal 7 (4), 329, 2013 | 4 | 2013 |
| Chemistry studies of low pressure argon discharges: experiments and simulation RS Pessoa, NS Bogos, MP Gomes, HS Maciel, HS Medeiros, JC Sagas, ... Argon: Production, Characteristics and Applications, 1st ed.; Pessoa, RS …, 2013 | 4 | 2013 |
| Argon incorporation on silicon carbide thin films deposited by bias co-sputtering technique HS Medeiros, RS Pessoa, MA Fraga, LV Santos, HS Maciel, M Massi, ... MRS Online Proceedings Library 1433 (1), 101-106, 2012 | 3 | 2012 |
| Automation of a Mass Flow Controller for Application in Time‐Multiplex SF6+CH4 Plasma Etching of Silicon LL Tezani, RS Pessoa, RS Moraes, HS Medeiros, CA Martins, HS Maciel, ... Contributions to Plasma Physics 52 (9), 735-743, 2012 | 3 | 2012 |
| Numeric model for assessment of naphthalene conversion through ionization reactions in a microwave air plasma torch A Pilatau, HS Medeiros, AS da Silva Sobrinho, G Petraconi Filho Energy & Fuels 30 (9), 7704-7712, 2016 | 2 | 2016 |
| Automation of a mass flow controller for application in time-multiplex SF {sub 6}+ CH {sub 4} plasma etching of silicon LL Tezani, RS Moraes, HS Medeiros, G Petraconi Filho, M Massi, ... Contributions to Plasma Physics (online) 52, 2012 | | 2012 |
| Morphological and Chemical Analysis of Silicon Etched by SF6+ O2 and CF4+ O2 Low Pressure Constricted Plasma Jet SM Wakawaiachi, LL Tezani, RS Pessoa, HS Medeiros, HS Maciel, ... ECS Transactions 39 (1), 409, 2011 | | 2011 |
