| Junctionless fabrication on SOI wafers using focused ion beam milling and Al diffusion LPB Lima, MVP dos Santos, FH Cioldin, JA Diniz, I Doi, JG Fo ECS Transactions 49 (1), 367, 2012 | 10 | 2012 |
| Definition of CVD graphene micro ribbons with lithography and oxygen plasma ashing FC Rufino, AM Pascon, LCJ Espindola, FH Cioldin, DRG Larrudé, ... Carbon Trends 4, 100056, 2021 | 9 | 2021 |
| Silicon micro-channel definition via ICP-RIE plasma etching process using different aluminum hardmasks HS Alvarez, FH Cioldin, AR Silva, LCJ Espínola, AR Vaz, JA Diniz Journal of Microelectromechanical Systems 30 (4), 668-674, 2021 | 8 | 2021 |
| Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers HS Alvarez, AR Silva, FH Cioldin, LCJ Espindola, JA Diniz Thin Solid Films 690, 137534, 2019 | 5 | 2019 |
| NH4OH Wet Etching for Silicon Nano or Sub-Micron Wires GMB Soares, AR Silva, LS Zucchi, FH Cioldin, L Espindola, J Godoy Filho, ... 2018 33rd Symposium on Microelectronics Technology and Devices (SBMicro), 1-4, 2018 | 2 | 2018 |
| Study of the phase transitions of Nickel Platinum Silicide obtained by sputtering and rapid thermal processing FH Cioldin, JA Diniz, AR Vaz, GA Calligaris, LP Cardoso, I Doi 2017 32nd Symposium on Microelectronics Technology and Devices (SBMicro), 1-4, 2017 | 2 | 2017 |
| Raman study of Nickel-Platinum Silicide formed by RTP process FH Cioldin, MVP Dos Santos, I Doi, JA Diniz, A Flacker, M Rautember, ... 28th Symposium on Microelectronics Technology and Devices (SBMicro 2013), 1-4, 2013 | 2 | 2013 |
| Vertical MOS and tunnel FETs in the same silicon pillar structure with Al and TiN gate electrodes LF Pinotti, FH Cioldin, AR Vaz, LCJ Espindola, JA Diniz Microelectronic Engineering 231, 111399, 2020 | 1 | 2020 |
| SF6/O2 plasma for ICP/RIE SiC Etching RR César, M Mederos, FH Cioldin, RM Beraldo, RC Teixeira, ... 2024 38th Symposium on Microelectronics Technology and Devices (SBMicro), 1-4, 2024 | | 2024 |
| Silicon micro-channel definition via ICP plasma etching process using different hard masks HS Alvarez, JA Diniz, CS Ruiz, AR Silva, FH Cioldin, N Junior Abstract Book, 2019 | | 2019 |
| FinFET prototypes fabricated by aluminium hard mask FIB milling for fin definition and SiON/TiN/Al gate stack A Leonhardt, LPB Lima, FH Cioldin, MVP dos Santos, JA Diniz, ... 2016 31st Symposium on Microelectronics Technology and Devices (SBMicro), 1-4, 2016 | | 2016 |
| Investigation of Thermal Stability of Titanium Nitride Using A RTA Process FH Cioldin, LPB Lima, I Doi, JA Diniz, J Godoy Filho, EA Zambotti ECS Transactions 49 (1), 407, 2012 | | 2012 |
| SiO2 etching process optimization, for facets formation in photonic chips based on LiNbO3 thin films. M Mederos, RR César, FH Cioldin, RC Teixeira, FAS Barbosa | | |
