| Hafnium oxide thin film grown by ALD: An XPS study D Barreca, A Milanov, RA Fischer, A Devi, E Tondello Surface Science Spectra 14 (1), 34-40, 2007 | 139 | 2007 |
| Dry reforming and reverse water gas shift: alternatives for syngas production? E Schwab, A Milanov, SA Schunk, A Behrens, N Schödel Chemie Ingenieur Technik 87 (4), 347-353, 2015 | 106 | 2015 |
| Synthesis, characterization, and thermal properties of homoleptic rare-earth guanidinates: promising precursors for MOCVD and ALD of rare-earth oxide thin films AP Milanov, RA Fischer, A Devi Inorganic chemistry 47 (23), 11405-11416, 2008 | 79 | 2008 |
| Dry reforming of methane with carbon dioxide over NiO–MgO–ZrO2 J Titus, T Roussière, G Wasserschaff, S Schunk, A Milanov, E Schwab, ... Catalysis Today 270, 68-75, 2016 | 64 | 2016 |
| Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare-earth nitride thin films TB Thiede, M Krasnopolski, AP Milanov, T de los Arcos, A Ney, ... Chemistry of Materials 23 (6), 1430-1440, 2011 | 61 | 2011 |
| Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2 A Milanov, R Bhakta, A Baunemann, HW Becker, R Thomas, P Ehrhart, ... Inorganic chemistry 45 (26), 11008-11018, 2006 | 61 | 2006 |
| Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal− Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films AP Milanov, TB Thiede, A Devi, RA Fischer Journal of the American Chemical Society 131 (47), 17062-17063, 2009 | 56 | 2009 |
| Atomic Layer Deposition of Gd2O3 and Dy2O3: A Study of the ALD Characteristics and Structural and Electrical Properties K Xu, R Ranjith, A Laha, H Parala, AP Milanov, RA Fischer, E Bugiel, ... Chemistry of Materials 24 (4), 651-658, 2012 | 55 | 2012 |
| Stabilization of amide-based complexes of niobium and tantalum using malonates as chelating ligands: Precursor chemistry and thin film deposition M Hellwig, A Milanov, D Barreca, JL Deborde, R Thomas, M Winter, ... Chemistry of Materials 19 (25), 6077-6087, 2007 | 55 | 2007 |
| Sc 2 O 3, Er 2 O 3, and Y 2 O 3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors AP Milanov, K Xu, S Cwik, H Parala, T de los Arcos, HW Becker, ... Dalton Transactions 41 (45), 13936-13947, 2012 | 53 | 2012 |
| Lanthanide oxide thin films by metalorganic chemical vapor deposition employing volatile guanidinate precursors AP Milanov, T Toader, H Parala, D Barreca, A Gasparotto, C Bock, ... Chemistry of Materials 21 (22), 5443-5455, 2009 | 51 | 2009 |
| Growth of Crystalline Gd2O3 Thin Films with a High-Quality Interface on Si(100) by Low-Temperature H2O-Assisted Atomic Layer Deposition AP Milanov, K Xu, A Laha, E Bugiel, R Ranjith, D Schwendt, HJ Osten, ... Journal of the American Chemical Society 132 (1), 36-37, 2010 | 49 | 2010 |
| Nanostructured Dy2O3 films: an XPS investigation D Barreca, A Gasparotto, A Milanov, E Tondello, A Devi, RA Fischer Surface Science Spectra 14 (1), 52-59, 2007 | 49 | 2007 |
| Tantalum complexes with all nitrogen coordination sphere: mixed amido-, imido-, guanidinato complexes of tantalum and their thermal behaviour A Baunemann, D Rische, A Milanov, Y Kim, M Winter, C Gemel, ... Dalton Transactions, 3051-3055, 2005 | 42 | 2005 |
| Gd2O3 Nanostructured Thin Films Analyzed by XPS D Barreca, A Gasparotto, A Milanov, E Tondello, A Devi, RA Fischer Surface Science Spectra 14 (1), 60-67, 2007 | 38 | 2007 |
| Structure–activity relationships of nickel–hexaaluminates in reforming reactions part II: activity and stability of nanostructured nickel–hexaaluminate‐based catalysts in the … T Roussière, L Schulz, KM Schelkle, G Wasserschaff, A Milanov, ... ChemCatChem 6 (5), 1447-1452, 2014 | 35 | 2014 |
| Thin films of HfO2 for high-k gate oxide applications from engineered alkoxide-and amide-based MOCVD precursors R Thomas, E Rije, P Ehrhart, A Milanov, R Bhakta, A Bauneman, A Devi, ... Journal of the Electrochemical Society 154 (3), G77, 2007 | 35 | 2007 |
| Heteroleptic Guanidinate‐ and Amidinate‐Based Complexes of Hafnium as New Precursors for MOCVD of HfO2 K Xu, AP Milanov, M Winter, D Barreca, A Gasparotto, HW Becker, A Devi European Journal of Inorganic Chemistry 2010 (11), 1679-01688, 2010 | 31 | 2010 |
| Liquid‐Injection MOCVD of ZrO2 Thin Films using Zirconium Bis(diethlyamido)‐bis(di‐tert‐butylmalonato) as a Novel Precursor R Thomas, A Milanov, R Bhakta, U Patil, M Winter, P Ehrhart, R Waser, ... Chemical Vapor Deposition 12 (5), 295-300, 2006 | 29 | 2006 |
| Thin Films of ZrO2 for High‐k Applications Employing Engineered Alkoxide‐ and Amide‐Based MOCVD Precursors R Thomas, R Bhakta, A Milanov, A Devi, P Ehrhart Chemical Vapor Deposition 13 (2‐3), 98-104, 2007 | 27 | 2007 |
