| Atomic-layer deposition of TiO2 thin films with a thermally stable (CpMe5) Ti (OMe) 3 precursor HK Chung, SO Won, Y Park, JS Kim, TJ Park, SK Kim Applied Surface Science 550, 149381, 2021 | 20 | 2021 |
| Effects of oxygen sources on properties of atomic-layer-deposited ferroelectric hafnium zirconium oxide thin films AJ Cho, J Jeon, HK Chung, IH Baek, K Yang, MH Park, SH Baek, SK Kim Ceramics International 48 (3), 3280-3286, 2022 | 6 | 2022 |
| Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition HK Chung, JJ Pyeon, IH Baek, GY Lee, H Lee, SO Won, JH Han, ... Journal of Vacuum Science & Technology A 38 (1), 2020 | 4 | 2020 |
| Area-Selective Atomic Layer Deposition of SnS2 Nanosheets for Applications of Back-End-of-Line-Compatible Transistors J Yim, HK Chung, SH Ryu, H Kim, SO Won, T Eom, TM Chung, SK Kim ACS Applied Nano Materials 6 (3), 1678-1685, 2023 | 3 | 2023 |
| Phase-controlled molybdenum dioxide electrodes by RF reactive magnetron sputtering for achieving high-k rutile TiO2 dielectric JH Lee, W Kang, HK Chung, SK Kim, JH Han Vacuum 220, 112776, 2024 | 2 | 2024 |
| Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nm HK Chung, J Jeon, H Kim, M Jang, SC Kim, SO Won, IH Baek, YJ Chung, ... Applied Surface Science 664, 160243, 2024 | 1 | 2024 |
| Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition HK Chung, H Kim, J Jeon, SC Kim, SO Won, R Harada, T Tsugawa, ... The Journal of Physical Chemistry Letters 14 (28), 6486-6493, 2023 | 1 | 2023 |
| Atomic Layer Growth of Rutile TiO2 Films with Ultrahigh Dielectric Constants via Crystal Orientation Engineering T Kim, J Jeon, SH Ryu, HK Chung, M Jang, S Lee, YJ Chung, SK Kim ACS Applied Materials & Interfaces, 2024 | | 2024 |
| High-Temperature Atomic Layer Deposition of Rutile TiO2 Films on RuO2 Substrates: Interfacial Reactions and Dielectric Performance J Jeon, T Kim, M Jang, HK Chung, SC Kim, SO Won, Y Park, BJ Choi, ... Chemistry of Materials 36 (7), 3326-3333, 2024 | | 2024 |
| Nucleation Behavior and Growth Characteristics of Atomic-Layer Deposited Iridium Thin Films with Ticp and Oxygen HK Chung, H Kim, TJ Park, SK Kim Electrochemical Society Meeting Abstracts 244, 1500-1500, 2023 | | 2023 |
| Sustained Area‐Selectivity in Atomic Layer Deposition of Ir Films: Utilization of Dual Effects of O3 in Deposition and Etching H Kim, T Kim, HK Chung, J Jeon, SC Kim, SO Won, R Harada, T Tsugawa, ... Small, 2402543, 0 | | |
