| Method and system for measuring patterned structures M Finarov, B Brill US Patent 6,657,736, 2003 | 109 | 2003 |
| Lateral shift measurement using an optical technique B Brill, M Finarov, D Scheiner US Patent 6,974,962, 2005 | 93 | 2005 |
| Process control for micro-lithography B Brill, Y Cohen US Patent 6,704,920, 2004 | 86 | 2004 |
| A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM A Vaid, BB Yan, YT Jiang, M Kelling, C Hartig, J Allgair, P Ebersbach, ... Metrology, Inspection, and Process Control for Microlithography XXV 7971, 21-40, 2011 | 78 | 2011 |
| Method and system for measuring in patterned structures B Brill, M Finarov US Patent 6,650,424, 2003 | 47 | 2003 |
| Ballistic electron spectroscopy of vertical superlattice minibands C Rauch, G Strasser, K Unterrainer, E Gornik, B Brill Applied physics letters 70 (5), 649-651, 1997 | 47 | 1997 |
| Method and system for measuring patterned structures M Finarov, B Brill US Patent 7,477,405, 2009 | 29 | 2009 |
| Optical system operating with variable angle of incidence B Brill, M Finarov, D Scheiner US Patent 7,292,341, 2007 | 27 | 2007 |
| Gun with combined operation by chemical propellant and plasma D Saphier, S Wald, J Ashkenazi, Z Kaplan, B Brill US Patent 5,233,903, 1993 | 27 | 1993 |
| Method and system for use in monitoring properties of patterned structures Y Cohen, B Brill US Patent 8,289,515, 2012 | 26 | 2012 |
| Line edge roughness measuring technique and test structure B Brill US Patent 8,488,128, 2013 | 25 | 2013 |
| Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope A Vaid, BB Yan, YT Jiang, M Kelling, C Hartig, J Allgair, P Ebersbach, ... Journal of Micro/Nanolithography, MEMS and MOEMS 10 (4), 043016-043016-13, 2011 | 25 | 2011 |
| Long-mean-free-path ballistic hot electrons in high-purity GaAs B Brill, M Heiblum Physical Review B 54 (24), R17280, 1996 | 21 | 1996 |
| Electron heating in GaAs due to electron-electron interactions B Brill, M Heiblum Physical Review B 49 (20), 14762, 1994 | 20 | 1994 |
| Optical measurements of line edge roughness B Brill US Patent 7,184,152, 2007 | 17 | 2007 |
| Lateral shift measurement using an optical technique B Brill, M Finarov, D Schiener US Patent 7,122,817, 2006 | 17 | 2006 |
| Optical system and method for measuring in three-dimensional structures G Barak, B Brill US Patent 8,848,185, 2014 | 14 | 2014 |
| Method and system for measuring patterned structures M Finarov, B Brill US Patent 7,626,710, 2009 | 14 | 2009 |
| Product-driven material characterization for improved scatterometry time-to-solution A Vaid, C Hartig, M Sendelbach, C Bozdog, HK Kim, M Sendler, Y Cohen, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 12 | 2009 |
| Method and system for measuring patterned structures M Finarov, B Brill US Patent App. 11/930,594, 2008 | 12 | 2008 |
