| Vanadium oxide monolayer catalysts. 3. A Raman spectroscopic and temperature-programmed reduction study of monolayer and crystal-type vanadia on various supports F Roozeboom, MC Mittelmeijer-Hazeleger, JA Moulijn, J Medema, ... The Journal of Physical Chemistry 84 (21), 2783-2791, 1980 | 486 | 1980 |
| Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition P Poodt, DC Cameron, E Dickey, SM George, V Kuznetsov, GN Parsons, ... Journal of Vacuum Science & Technology A 30 (1), 2012 | 450 | 2012 |
| 3‐D integrated all‐solid‐state rechargeable batteries PHL Notten, F Roozeboom, RAH Niessen, L Baggetto Advanced Materials 19 (24), 4564-4567, 2007 | 448 | 2007 |
| Energetics of self-interstitial clusters in Si NEB Cowern, G Mannino, PA Stolk, F Roozeboom, HGA Huizing, ... Physical Review Letters 82 (22), 4460, 1999 | 414 | 1999 |
| High energy density all‐solid‐state batteries: a challenging concept towards 3D integration L Baggetto, RAH Niessen, F Roozeboom, PHL Notten Advanced Functional Materials 18 (7), 1057-1066, 2008 | 409 | 2008 |
| High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation P Poodt, A Lankhorst, F Roozeboom, K Spee, D Maas, A Vermeer Adv. Mater 22 (32), 3564-3567, 2010 | 405 | 2010 |
| Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor JL Van Hemmen, SBS Heil, JH Klootwijk, F Roozeboom, CJ Hodson, ... Journal of The Electrochemical Society 154 (7), G165, 2007 | 362 | 2007 |
| Rapid thermal processing: science and technology RB Fair Academic Press, 2012 | 202 | 2012 |
| Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor SBS Heil, JL Van Hemmen, CJ Hodson, N Singh, JH Klootwijk, ... Journal of Vacuum Science & Technology A 25 (5), 1357-1366, 2007 | 202 | 2007 |
| Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle A Mameli, MJM Merkx, B Karasulu, F Roozeboom, WEMM Kessels, ... ACS nano 11 (9), 9303-9311, 2017 | 198 | 2017 |
| Ultrahigh capacitance density for multiple ALD-grown MIM capacitor stacks in 3-D silicon JH Klootwijk, KB Jinesh, W Dekkers, JF Verhoeven, FC Van Den Heuvel, ... IEEE Electron Device Letters 29 (7), 740-742, 2008 | 185 | 2008 |
| Atomic layer etching: What can we learn from atomic layer deposition? T Faraz, F Roozeboom, HCM Knoops, WMM Kessels ECS Journal of Solid State Science and Technology 4 (6), N5023, 2015 | 167 | 2015 |
| Rapid thermal processing systems: A review with emphasis on temperature control F Roozeboom, N Parekh Journal of Vacuum Science & Technology B: Microelectronics Processing and …, 1990 | 159 | 1990 |
| Vanadium oxide monolayer catalysts. I. Preparation, characterization, and thermal stability F Roozeboom, T Fransen, P Mars, PJ Gellings Zeitschrift für anorganische und allgemeine Chemie 449 (1), 25-40, 1979 | 150 | 1979 |
| Vanadium oxide monolayer catalysts: the vapor-phase oxidation of methanol F Roozeboom, PD Cordingley, PJ Gellings Journal of Catalysis 68 (2), 464-472, 1981 | 149 | 1981 |
| Low-temperature deposition of TiN by plasma-assisted atomic layer deposition SBS Heil, E Langereis, F Roozeboom, MCM Van De Sanden, ... Journal of the Electrochemical Society 153 (11), G956, 2006 | 145 | 2006 |
| Ferromagnetic resonance and eddy currents in high-permeable thin films E Van de Riet, F Roozeboom Journal of applied physics 81 (1), 350-354, 1997 | 136 | 1997 |
| Spatial atomic layer deposition of zinc oxide thin films A Illiberi, F Roozeboom, P Poodt ACS applied materials & interfaces 4 (1), 268-272, 2012 | 128 | 2012 |
| Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications HCM Knoops, L Baggetto, E Langereis, MCM Van De Sanden, ... Journal of the Electrochemical Society 155 (12), G287, 2008 | 125 | 2008 |
| Thermally assisted reversal of exchange biasing in NiO and FeMn based systems PAA Van der Heijden, T Maas, WJM De Jonge, JCS Kools, F Roozeboom, ... Applied physics letters 72 (4), 492-494, 1998 | 124 | 1998 |
