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Ernest Chen
Ernest Chen
在 ucla.edu 的电子邮件经过验证
标题
引用次数
引用次数
年份
Platinum Nanoparticle Loading of Boron Nitride Aerogel and Its Use as a Novel Material for Low‐Power Catalytic Gas Sensing
A Harley‐Trochimczyk, T Pham, J Chang, E Chen, MA Worsley, A Zettl, ...
Advanced Functional Materials 26 (3), 433-439, 2016
992016
Directional etch of magnetic and noble metals. II. Organic chemical vapor etch
JKC Chen, ND Altieri, T Kim, E Chen, T Lill, M Shen, JP Chang
Journal of Vacuum Science & Technology A 35 (5), 2017
672017
Ion beam assisted organic chemical vapor etch of magnetic thin films
JKC Chen, T Kim, ND Altieri, E Chen, JP Chang
Journal of Vacuum Science & Technology A 35 (3), 2017
322017
Review on recent progress in patterning phase change materials
M Shen, T Lill, N Altieri, J Hoang, S Chiou, J Sims, A McKerrow, ...
Journal of Vacuum Science & Technology A 38 (6), 2020
172020
Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing
X Sang, E Chen, JP Chang
Journal of Vacuum Science & Technology A 38 (4), 2020
172020
Effects of plasma etching on GeSbTe compositional control
EL Chen
University of California, Los Angeles, 2020
42020
Selective deposition and co-deposition processes for ferromagnetic thin films
JOI Aniruddha, E Chen, Y Dordi
US Patent 9,476,124, 2016
12016
Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing (vol 38, 042603, 2020)
X Sang, E Chen, JP Chang
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 39 (1), 2021
2021
Errata:‘‘Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing’’[J. Vac. Sci. Technol. A 38, 042603 (2020)]
X Sang, E Chen, JP Chang
Journal of Vacuum Science & Technology A 39 (1), 2021
2021
Electroless Deposition of Ferromagnetic CoxFe1-x alloys Using Metal Ion Reducing Agent
A Joi, E Chen, Y Dordi
Electrochemical Society Meeting Abstracts 228, 826-826, 2015
2015
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