| Shapes and vorticities of superfluid helium nanodroplets LF Gomez, KR Ferguson, JP Cryan, C Bacellar, RMP Tanyag, C Jones, ... science 345 (6199), 906-909, 2014 | 276 | 2014 |
| Mechanistic Advantages of Organotin Molecular EUV Photoresists JH Ma, C Needham, H Wang, A Neureuther, D Prendergast, P Naulleau ACS applied materials & interfaces 14 (4), 5514-5524, 2022 | 22 | 2022 |
| Additive Lithography–Organic Monolayer Patterning Coupled with an Area-Selective Deposition R Wojtecki, J Ma, I Cordova, N Arellano, K Lionti, T Magbitang, ... ACS applied materials & interfaces 13 (7), 9081-9090, 2021 | 20 | 2021 |
| Experimental characterization of model resist materials O Kostko, TR McAfee, J Ma, JM Blackwell, P Naulleau International Conference on Extreme Ultraviolet Lithography 2021 11854, 24-34, 2021 | 13 | 2021 |
| Crystalline symmetry-protected non-trivial topology in prototype compound BaAl4 K Wang, R Mori, Z Wang, L Wang, JHS Ma, DW Latzke, DE Graf, ... npj Quantum Materials 6 (1), 28, 2021 | 13 | 2021 |
| Interplay of superconductivity and bosonic coupling in the peak-dip-hump structure of TL Miller, W Zhang, J Ma, H Eisaki, JE Moore, A Lanzara Physical Review B 97 (13), 134517, 2018 | 13 | 2018 |
| Determination of effective attenuation length of slow electrons in polymer films JH Ma, P Naulleau, M Ahmed, O Kostko Journal of Applied Physics 127 (24), 245301, 2020 | 12 | 2020 |
| Excitation selectivity in model tin-oxo resist: a computational chemistry perspective JH Ma, H Wang, D Prendergast, A Neureuther, P Naulleau Extreme Ultraviolet (EUV) Lithography XI 11323, 349-355, 2020 | 10 | 2020 |
| Investigating EUV radiochemistry with condensed phase photoemission J Ma, AR Neureuther, PP Naulleau Extreme Ultraviolet (EUV) Lithography X 10957, 392-400, 2019 | 8 | 2019 |
| Sizes of pure and doped helium droplets from single shot x-ray imaging RMP Tanyag, C Bacellar, W Pang, C Bernando, LF Gomez, CF Jones, ... The Journal of chemical physics 156 (4), 041102, 2022 | 6 | 2022 |
| Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations JH Ma, H Wang, D Prendergast, A Neureuther, P Naulleau Journal of Micro/Nanolithography, MEMS, and MOEMS 19 (3), 034601-034601, 2020 | 6 | 2020 |
| Investigating EUV radiation chemistry with first principle quantum chemistry calculations JH Ma, H Wang, D Prendergast, A Neureuther, P Naulleau International Conference on Extreme Ultraviolet Lithography 2019 11147, 103-113, 2019 | 6 | 2019 |
| Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy G Conti, HP Martins, IA Cordova, J Ma, RJ Wojtecki, P Naulleau, ... Journal of Micro/Nanopatterning, Materials, and Metrology 20 (3), 034603-034603, 2021 | 3 | 2021 |
| Spatial nematic fluctuation in revealed by spatially and angle-resolved photoemission spectroscopy J Ma, M Yi, G Affeldt, I Hayes, C Jozwiak, A Bostwick, E Rotenberg, ... Physical Review B 101 (9), 094515, 2020 | 3 | 2020 |
| Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers JH Ma, IA Cordova, R Wojtecki, A Neureuther, PP Naulleau Extreme Ultraviolet Lithography 2020 11517, 115170H, 2020 | 2 | 2020 |
| Experimental characterization of model extreme ultraviolet resist materials O Kostko, TR McAfee, J Ma, JM Blackwell, P Naulleau Journal of Micro/Nanopatterning, Materials, and Metrology 23 (1), 014602-014602, 2024 | 1 | 2024 |
| Characterization of secondary electron blur via determination of electron attenuation length O Kostko, T McAfee, J Ma, P Naulleau Extreme Ultraviolet (EUV) Lithography XII 11609, 116091V, 2021 | 1 | 2021 |
| Sub-nm depth characterization of EUV nanoscale photoresist films by standing-wave photoemission spectroscopy G Conti, HPP Martins, IA Cordova, J Ma, RJ Wojtecki, P Naulleau, ... Extreme Ultraviolet Lithography 2020 11517, 29-35, 2020 | 1 | 2020 |
| Elucidating the radiation chemistry of prototypical tin-oxo resist with first-principles computations JH Ma, PP Naulleau, D Prendergast, A Neureuther Extreme Ultraviolet (EUV) Lithography XII 11609, 116091B, 2021 | | 2021 |
| Understanding secondary electron driven EUV chemistry (Conference Presentation) JH Ma, P Naulleau, A Neureuther Extreme Ultraviolet (EUV) Lithography XI 11323, 113231F, 2020 | | 2020 |
