关注
Yo-Sep Min
Yo-Sep Min
Professor, Chemical Engineering, Konkuk University, Seoul, Korea
在 konkuk.ac.kr 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Method of manufacturing inorganic nanotube
Y Min, E Bae, W Choi, YJ Cho, J Lee
US Patent 7,005,391, 2006
4352006
High Turnover Frequency of Hydrogen Evolution Reaction on Amorphous MoS2 Thin Film Directly Grown by Atomic Layer Deposition
S Shin, Z Jin, DH Kwon, R Bose, YS Min
Langmuir 31 (3), 1196-1202, 2015
2292015
Novel chemical route for atomic layer deposition of MoS 2 thin film on SiO 2/Si substrate
Z Jin, S Shin, SJ Han, YS Min
Nanoscale 6 (23), 14453-14458, 2014
2242014
Low temperature (< 100 C) deposition of aluminum oxide thin films by ALD with O3 as oxidant
SK Kim, SW Lee, CS Hwang, YS Min, JY Won, J Jeong
Journal of The Electrochemical Society 153 (5), F69, 2006
2042006
Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors
SW Lee, JH Han, S Han, W Lee, JH Jang, M Seo, SK Kim, C Dussarrat, ...
Chemistry of Materials 23 (8), 2227-2236, 2011
1562011
Ruthenium oxide nanotube arrays fabricated by atomic layer deposition using a carbon nanotube template
YS Min, EJ Bae, KS Jeong, YJ Cho, JH Lee, WB Choi, GS Park
Advanced Materials 15 (12), 1019-1022, 2003
1462003
Deposition method of a dielectric layer
J Lee, Y Min, YJ Cho
US Patent 6,911,402, 2005
1342005
Low-temperature growth of single-walled carbon nanotubes by plasma enhanced chemical vapor deposition
EJ Bae, YS Min, D Kang, JH Ko, W Park
Chemistry of materials 17 (20), 5141-5145, 2005
922005
Low-temperature growth of single-walled carbon nanotubes by water plasma chemical vapor deposition
YS Min, EJ Bae, BS Oh, D Kang, W Park
Journal of the American Chemical Society 127 (36), 12498-12499, 2005
902005
Growth and characterization of conducting ZnO thin films by atomic layer deposition
YS Min, CJ An, SK Kim, JW Song, CS Hwang
Bulletin of the Korean Chemical Society 31 (9), 2503-2508, 2010
882010
Growth characteristics of atomic layer deposited TiO2 thin films on Ru and Si electrodes for memory capacitor applications
WD Kim, GW Hwang, OS Kwon, SK Kim, M Cho, DS Jeong, SW Lee, ...
Journal of The Electrochemical Society 152 (8), C552, 2005
882005
Importance of hydrophilic pretreatment in the hydrothermal growth of amorphous molybdenum sulfide for hydrogen evolution catalysis
R Bose, SK Balasingam, S Shin, Z Jin, DH Kwon, Y Jun, YS Min
Langmuir 31 (18), 5220-5227, 2015
822015
Atomic layer deposition of Al2O3 thin films from a 1-methoxy-2-methyl-2-propoxide complex of aluminum and water
YS Min, YJ Cho, CS Hwang
Chemistry of materials 17 (3), 626-631, 2005
762005
Program/erase characteristics of amorphous gallium indium zinc oxide nonvolatile memory
H Yin, S Kim, H Lim, Y Min, CJ Kim, I Song, J Park, SW Kim, ...
IEEE transactions on electron devices 55 (8), 2071-2077, 2008
722008
Enhanced stability of coated carbon electrode for Li-O2 batteries and its limitations
Y Bae, DH Ko, S Lee, HD Lim, YJ Kim, HS Shim, H Park, Y Ko, SK Park, ...
Advanced Energy Materials 8, 1702661, 2018
652018
Co-catalytic Effects of CoS2 on the Activity of the MoS2 Catalyst for Electrochemical Hydrogen Evolution
R Bose, Z Jin, S Shin, S Kim, S Lee, YS Min
Langmuir 33 (23), 5628-5635, 2017
652017
A comprehensive study on atomic layer deposition of molybdenum sulfide for electrochemical hydrogen evolution
Z Jin, S Shin, WS Lee, YS Min
Nanoscale 8 (13), 7180-7188, 2016
622016
ZnO nanoparticle growth on single-walled carbon nanotubes by atomic layer deposition and a consequent lifetime elongation of nanotube field emission
YS Min, EJ Bae, JB Park, UJ Kim, W Park, J Song, CS Hwang, N Park
Applied physics letters 90 (26), 2007
572007
Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film
YJ Cho, Y Min, Y Park, J Lee, J Lee, Y Lee
US Patent 6,919,597, 2005
542005
Atomic layer deposition of hafnium oxide from tert-butoxytris (ethylmethylamido) hafnium and ozone: rapid growth, high density and thermal stability
M Seo, YS Min, SK Kim, TJ Park, JH Kim, KD Na, CS Hwang
Journal of Materials Chemistry 18 (36), 4324-4331, 2008
512008
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