| Fused silver nanowires with metal oxide nanoparticles and organic polymers for highly transparent conductors R Zhu, CH Chung, KC Cha, W Yang, YB Zheng, H Zhou, TB Song, ... ACS nano 5 (12), 9877-9882, 2011 | 433 | 2011 |
| CZTS nanocrystals: a promising approach for next generation thin film photovoltaics H Zhou, WC Hsu, HS Duan, B Bob, W Yang, TB Song, CJ Hsu, Y Yang Energy & Environmental Science 6 (10), 2822-2838, 2013 | 431 | 2013 |
| Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) KJ Kanarik, J Marks, H Singh, S Tan, A Kabansky, W Yang, KIM Taeseung, ... US Patent 9,576,811, 2017 | 321 | 2017 |
| The role of sulfur in solution‐processed Cu2ZnSn (S, Se) 4 and its effect on defect properties HS Duan, W Yang, B Bob, CJ Hsu, B Lei, Y Yang Advanced Functional Materials 23 (11), 1466-1471, 2013 | 247 | 2013 |
| Novel solution processing of high‐efficiency earth‐abundant Cu2ZnSn (S, Se) 4 solar cells W Yang, HS Duan, B Bob, H Zhou, B Lei, CH Chung, SH Li, WW Hou, ... Advanced Materials 24 (47), 6323-6329, 2012 | 238 | 2012 |
| Atomic layer etching of tungsten for enhanced tungsten deposition fill CS Lai, KJ Kanarik, S Tan, A Chandrashekar, TT Su, W Yang, M Wood, ... US Patent 9,972,504, 2018 | 174 | 2018 |
| Rational Defect Passivation of Cu2ZnSn(S,Se)4 Photovoltaics with Solution-Processed Cu2ZnSnS4:Na Nanocrystals H Zhou, TB Song, WC Hsu, S Luo, S Ye, HS Duan, CJ Hsu, W Yang, ... Journal of the American Chemical Society 135 (43), 15998-16001, 2013 | 171 | 2013 |
| Predicting synergy in atomic layer etching KJ Kanarik, S Tan, W Yang, T Kim, T Lill, A Kabansky, EA Hudson, T Ohba, ... Journal of Vacuum Science & Technology A 35 (5), 2017 | 114 | 2017 |
| Dry plasma etch method to pattern MRAM stack S Tan, KIM Taeseung, W Yang, J Marks, T Lill US Patent 9,806,252, 2017 | 104 | 2017 |
| Growth mechanisms of co‐evaporated kesterite: a comparison of Cu‐rich and Zn‐rich composition paths WC Hsu, I Repins, C Beall, C DeHart, B To, W Yang, Y Yang, R Noufi Progress in Photovoltaics: Research and Applications 22 (1), 35-43, 2014 | 87 | 2014 |
| The Development of Hydrazine‐Processed Cu(In,Ga)(Se,S)2 Solar Cells B Bob, B Lei, CH Chung, W Yang, WC Hsu, HS Duan, WWJ Hou, SH Li, ... Advanced Energy Materials 2 (5), 504-522, 2012 | 86 | 2012 |
| Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach KN Tomihito Ohba, Wenbing Yang, Samantha Tan, Keren J. Kanarik Japanese Journal of Applied Physics 56 (06HB06), 2017 | 74 | 2017 |
| Molecular Solution Approach To Synthesize Electronic Quality Cu2ZnSnS4 Thin Films W Yang, HS Duan, KC Cha, CJ Hsu, WC Hsu, H Zhou, B Bob, Y Yang Journal of the American Chemical Society 135 (18), 6915-6920, 2013 | 72 | 2013 |
| Reaction pathways for the formation of Cu 2 ZnSn (Se, S) 4 absorber materials from liquid-phase hydrazine-based precursor inks WC Hsu, B Bob, W Yang, CH Chung, Y Yang Energy & Environmental Science 5 (9), 8564-8571, 2012 | 69 | 2012 |
| Benign Solutions and Innovative Sequential Annealing Processes for High Performance Cu2ZnSn(Se,S)4 Photovoltaics CJ Hsu, HS Duan, W Yang, H Zhou, Y Yang Advanced Energy Materials 4 (6), 1301287, 2014 | 68 | 2014 |
| Synthesis of bimetallic Pt-Pd core-shell nanocrystals and their high electrocatalytic activity modulated by Pd shell thickness Y Li, ZW Wang, CY Chiu, L Ruan, W Yang, Y Yang, RE Palmer, Y Huang Nanoscale 4 (3), 845-851, 2012 | 65 | 2012 |
| Spatial Element Distribution Control in a Fully Solution-Processed Nanocrystals-Based 8.6% Cu2ZnSn(S,Se)4 Device WC Hsu, H Zhou, S Luo, TB Song, YT Hsieh, HS Duan, S Ye, W Yang, ... ACS nano 8 (9), 9164-9172, 2014 | 63 | 2014 |
| Identification of the Molecular Precursors for Hydrazine Solution Processed CuIn(Se,S)2 Films and Their Interactions CH Chung, SH Li, B Lei, W Yang, WW Hou, B Bob, Y Yang Chemistry of Materials 23 (4), 964-969, 2011 | 63 | 2011 |
| Highly selective directional atomic layer etching of silicon S Tan, W Yang, KJ Kanarik, T Lill, V Vahedi, J Marks, RA Gottscho ECS Journal of Solid State Science and Technology 4 (6), N5010, 2015 | 59 | 2015 |
| Method to etch non-volatile metal materials SSH Tan, W Yang, M Shen, RP Janek, J Marks, H Singh, T Lill US Patent 9,257,638, 2016 | 53 | 2016 |
