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Darsen Lu
Darsen Lu
NCKU
在 cal.berkeley.edu 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Arrays of single-walled carbon nanotubes with full surface coverage for high-performance electronics
Q Cao, S Han, GS Tulevski, Y Zhu, DD Lu, W Haensch
Nature nanotechnology 8 (3), 180-186, 2013
5372013
FinFET modeling for IC simulation and design: using the BSIM-CMG standard
YS Chauhan, D Lu, S Vanugopalan, S Khandelwal, JP Duarte, ...
Academic Press, 2015
2392015
BSIM-IMG: A compact model for ultrathin-body SOI MOSFETs with back-gate control
S Khandelwal, YS Chauhan, DD Lu, S Venugopalan, MAU Karim, ...
IEEE Transactions on Electron Devices 59 (8), 2019-2026, 2012
1192012
Modeling advanced FET technology in a compact model
MV Dunga, CH Lin, X Xi, DD Lu, AM Niknejad, C Hu
IEEE Transactions on Electron Devices 53 (9), 1971-1978, 2006
1162006
BSIM4v4. 7 MOSFET model
TH Morshed, DD Lu, WM Yang, MV Dunga, X Xi, J He, W Liu, MC Kanyu, ...
Dept Elect Eng Comput Sci Univ Calif. Berkeley Berkeley CA USA Tech Rep, 2011
862011
Ultra-Low Power Robust 3bit/cell Hf0.5Zr0.5O2 Ferroelectric FinFET with High Endurance for Advanced Computing-In-Memory Technology
S De, DD Lu, HH Le, S Mazumder, YJ Lee, WC Tseng, BH Qiu, MA Baig, ...
2021 symposium on VLSI technology, 1-2, 2021
752021
BSIM-MG: A versatile multi-gate FET model for mixed-signal design
MV Dunga, CH Lin, DD Lu, W Xiong, CR Cleavelin, P Patruno, JR Hwang, ...
2007 IEEE Symposium on VLSI Technology, 60-61, 2007
672007
Compact modeling of variation in FinFET SRAM cells
DD Lu, CH Lin, AM Niknejad, C Hu
IEEE Design & Test of Computers 27 (2), 44-50, 2010
562010
FinFET with encased air-gap spacers for high-performance and low-energy circuits
AB Sachid, YM Huang, YJ Chen, CC Chen, DD Lu, MC Chen, C Hu
IEEE Electron Device Letters 38 (1), 16-19, 2016
542016
Extraction of isothermal condition and thermal network in UTBB SOI MOSFETs
MA Karim, YS Chauhan, S Venugopalan, AB Sachid, DD Lu, BY Nguyen, ...
IEEE Electron Device Letters 33 (9), 1306-1308, 2012
532012
Uniform Crystal Formation and Electrical Variability Reduction in Hafnium-Oxide-Based Ferroelectric Memory by Thermal Engineering
S De, BH Qiu, WX Bu, MA Baia, PJ Sung, CJ Su, YJ Lee, DD Lu
ACS Applied Electronic Materials 3, 619-628, 2021
522021
First Demonstration of CMOS Inverter and 6T-SRAM Based on GAA CFETs Structure for 3D-IC Applications
SW Chang, PJ Sung, TY Chu, D Lu, CJ Wang, NC Lin, CJ Su, SH Lo, ...
IEEE International Electron Devices Meeting, 254-257, 2019
502019
Random and Systematic Variation in Nanoscale Hf0.5Zr0.5O2 Ferroelectric FinFETs: Physical Origin and Neuromorphic Circuit Implications
S De, MA Baig, BH Qiu, F Müller, HH Le, M Lederer, T Kämpfe, T Ali, ...
Frontiers in Nanotechnology 3, 826232, 2022
462022
A multi-gate MOSFET compact model featuring independent-gate operation
DD Lu, MV Dunga, CH Lin, AM Niknejad, C Hu
2007 IEEE International Electron Devices Meeting, 565-568, 2007
462007
Bsim4v4. 8.0 mosfet model
N Paydavosi, TH Morshed, DD Lu, WM Yang, MV Dunga, XJ Xi, J He, ...
University of California, Berkeley (CA), 2013
422013
Number and volume raindrop size distributions in Taiwan
JY Lu, CC Su, TF Lu, MM Maa
Hydrological Processes: An International Journal 22 (13), 2148-2158, 2008
402008
Read-optimized 28nm hkmg multibit fefet synapses for inference-engine applications
S De, F Müller, HH Le, M Lederer, Y Raffel, T Ali, D Lu, T Kämpfe
IEEE Journal of the Electron Devices Society 10, 637-641, 2022
372022
A computationally efficient compact model for fully-depleted SOI MOSFETs with independently-controlled front-and back-gates
DD Lu, MV Dunga, CH Lin, AM Niknejad, C Hu
Solid-state electronics 62 (1), 31-39, 2011
352011
Bottom oxidation through STI (BOTS)—A novel approach to fabricate dielectric isolated FinFETs on bulk substrates
K Cheng, S Seo, J Faltermeier, D Lu, T Standaert, I Ok, A Khakifirooz, ...
2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical …, 2014
342014
BSIM-CG: A compact model of cylindrical/surround gate MOSFET for circuit simulations
S Venugopalan, DD Lu, Y Kawakami, PM Lee, AM Niknejad, C Hu
Solid-State Electronics 67 (1), 79-89, 2012
342012
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