| Effect of composition of substrate-modifying random copolymers on the orientation of symmetric and asymmetric diblock copolymer domains E Han, KO Stuen, YH La, PF Nealey, P Gopalan Macromolecules 41 (23), 9090-9097, 2008 | 313 | 2008 |
| Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features CC Liu, A Ramírez-Hernández, E Han, GSW Craig, Y Tada, H Yoshida, ... Macromolecules 46 (4), 1415-1424, 2013 | 254 | 2013 |
| Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions E Han, KO Stuen, M Leolukman, CC Liu, PF Nealey, P Gopalan Macromolecules 42 (13), 4896-4901, 2009 | 253 | 2009 |
| Fabrication of lithographically defined chemically patterned polymer brushes and mats CC Liu, E Han, MS Onses, CJ Thode, S Ji, P Gopalan, PF Nealey Macromolecules 44 (7), 1876-1885, 2011 | 241 | 2011 |
| One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers. T Hirai, M Leolukman, CC Liu, E Han, YJ Kim, Y Ishida, T Hayakawa, ... Advanced Materials (Deerfield Beach, Fla.) 21 (43), 4334-4338, 2009 | 219 | 2009 |
| Photopatternable imaging layers for controlling block copolymer microdomain orientation E Han, I In, SM Park, YH La, Y Wang, PF Nealey, P Gopalan Advanced Materials 19 (24), 4448-4452, 2007 | 133 | 2007 |
| Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates E Han, H Kang, CC Liu, PF Nealey, P Gopalan Advanced Materials 38 (22), 4325-4329, 2010 | 115 | 2010 |
| Integration of block copolymer directed assembly with 193 immersion lithography CC Liu, PF Nealey, AK Raub, PJ Hakeem, SRJ Brueck, E Han, P Gopalan Journal of Vacuum Science & Technology B 28 (6), C6B30-C6B34, 2010 | 105 | 2010 |
| Cross-linked random copolymer mats as ultrathin nonpreferential layers for block copolymer self-assembly E Han, P Gopalan Langmuir 26 (2), 1311-1315, 2010 | 70 | 2010 |
| Electronic transport and Raman scattering in size-controlled nanoperforated graphene M Kim, NS Safron, E Han, MS Arnold, P Gopalan Acs Nano 6 (11), 9846-9854, 2012 | 64 | 2012 |
| Bulk and Thin Film Morphological Behavior of Broad Dispersity Poly(styrene-b-methyl methacrylate) Diblock Copolymers JM Widin, M Kim, AK Schmitt, E Han, P Gopalan, MK Mahanthappa Macromolecules 46 (11), 4472-4480, 2013 | 54 | 2013 |
| Resist free patterning of nonpreferential buffer layers for block copolymer lithography E Han, M Leolukman, M Kim, P Gopalan ACS nano 4 (11), 6527-6534, 2010 | 41 | 2010 |
| Interplay of surface chemical composition and film thickness on graphoepitaxial assembly of asymmetric block copolymers M Kim, E Han, DP Sweat, P Gopalan Soft Matter 9 (26), 6135-6141, 2013 | 31 | 2013 |
| Degree of perfection and pattern uniformity in the directed assembly of cylinder-forming block copolymer on chemically patterned surfaces H Kang, GSW Craig, E Han, P Gopalan, PF Nealey Macromolecules 45 (1), 159-164, 2012 | 31 | 2012 |
| Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight KO Stuen, I In, E Han, JA Streifer, RJ Hamers, PF Nealey, P Gopalan Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 31 | 2007 |
| A dual functional layer for block copolymer self-assembly and the growth of nanopatterned polymer brushes DP Sweat, M Kim, X Yu, SK Schmitt, E Han, JW Choi, P Gopalan Langmuir 29 (41), 12858-12865, 2013 | 29 | 2013 |
| Photopatternable imaging layers for controlling block copolymer microdomain orientation P Gopalan, E Han US Patent 8,362,179, 2013 | 28 | 2013 |
| Patternable polymer block brush layers P Gopalan, E Han US Patent 9,388,268, 2016 | 25 | 2016 |
| Chemical patterns from surface grafted resists for directed assembly of block copolymers E Han, M Kim, P Gopalan ACS nano 6 (2), 1823-1829, 2012 | 25 | 2012 |
| Method for creating alternate hardmask cap interconnect structure with increased overlay margin RL Bristol, M Chandhok, JS Chawla, F Gstrein, E Han, R Hourani, K Lin, ... US Patent 10,109,583, 2018 | 13 | 2018 |
