| Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration F Challali, D Mendil, T Touam, T Chauveau, V Bockelée, AG Sanchez, ... Materials Science in Semiconductor Processing 118, 105217, 2020 | 54 | 2020 |
| Influence of growth time and substrate type on the microstructure and luminescence properties of ZnO thin films deposited by RF sputtering D Mendil, F Challali, T Touam, A Chelouche, AH Souici, S Ouhenia, ... Journal of Luminescence 215, 116631, 2019 | 45 | 2019 |
| Preparation of RF sputtered AZO/Cu/AZO multilayer films and the investigation of Cu thickness and substrate effects on their microstructural and optoelectronic properties D Mendil, F Challali, T Touam, V Bockelee, S Ouhenia, A Souici, ... Journal of Alloys and Compounds 860, 158470, 2021 | 33 | 2021 |
| Role of substrate and annealing on microstructural, optoelectronic and luminescence properties of RF magnetron sputtered AZO thin films in confocal configuration M Mohamedi, F Challali, T Touam, D Mendil, S Ouhenia, AH Souici, ... Journal of Luminescence 244, 118739, 2022 | 11 | 2022 |
| Growth of AZO/Cu/AZO multilayer structures by confocal RF magnetron sputtering and their microstructural and optoelectronic properties before and after annealing D Mendil, F Challali, T Touam, S Ouhenia, M Boudaa, A Souici, D Djouadi, ... Materials Science and Engineering: B 284, 115889, 2022 | 10 | 2022 |
| Ag thickness and substrate effects on microstructural and optoelectronic properties of AZO/Ag/AZO multilayer structures deposited by confocal RF magnetron sputtering M Mohamedi, F Challali, T Touam, M Konstantakopoulou, V Bockelée, ... Applied Physics A 129 (8), 545, 2023 | 7 | 2023 |
| ZnO thin films grown by plasma sputtering process for optoelectronic applications: Effect of substrate type D Mendil, F Challali, T Touam, A Chelouche, D Djouadi Proceedings of the 4th International Symposium on Materials and Sustainable …, 2020 | 6 | 2020 |
| Spatial Evolution Study of EEDFs and Plasma Parameters in RF Stochastic Regime by Langmuir Probe D Mendil, H Lahmar, L Boufendi Plasma Science and Technology 16 (9), 837, 2014 | 6 | 2014 |
| Zno nanorods prepared by ultrasonic spray pyrolysis: Effect of deposition time on the structural morphological and optical properties F Ynineb, DE Guitoume, D Mendil, N Attaf, MS Aida, H Farh Defect and Diffusion Forum 397, 88-100, 2019 | 5 | 2019 |
| Kinetic Monte Carlo simulation of self-organized growth of silver nanoparticles in a TiO2 matrix A Bouhadiche, S Benghorieb, T Touam, D Mendil, A Chelouche Journal of Crystal Growth 556, 125992, 2021 | 2 | 2021 |
| Development of a Radiofrequency Plasma Diagnostic System with a Langmuir Probe and Study of a Capacitively Coupled Argon Plasma D Mendil, H Lahmar, D Ouadjaout, L Henni, L Boufendi, D Louhibi, ... Advanced Materials Research 227, 204-207, 2011 | 2 | 2011 |
| Structural, Morphological, and Optoelectronic Properties of RF Sputtered AZO Thin Films on Glass and Polymer Substrates: A Comparative Study D Mendil, T Touam, A Chelouche, A Djermoune, M Boudaa, F Challali ECS Journal of Solid State Science and Technology 13 (10), 103004, 2024 | | 2024 |
| Microstructural and optoelectronic properties of sputtered Al: ZnO films and Al: ZnO/Cu bilayer structures: Effects of substrate and Cu thickness NEA Doghmane, D Mendil, T Touam, A Chelouche, M Boudaa, A Souici, ... Thin Solid Films 803, 140482, 2024 | | 2024 |
| Growth of ZnO Nanorods by Template-Free Sol-Gel Dip-Coating Technique: Effect of Pre-Annealing Temperature DE Guitoume, F Ynineb, D Mendil, H Farh, N Attaf, MS Aida Defect and Diffusion Forum 397, 111-117, 2019 | | 2019 |
| Mise au point d'un système de diagnostic des décharges RF basse préssion par sonde de langmuir D Mendil Alger, 2011 | | 2011 |
| Study of spacial evolution of EEDFs and plasma parameters in RF-CCP argon stochastic mode discharge by Langmuir probe D Mendil, H Lahmar, L Boufendi, D Ouadjaout, L Henni, D Louhibi, ... | | |
| INVESTIGATION OF EEDF AND ELECTRON DENSITY AND TEMPERATURE BY DEVELOPED LANGMUIR PROBE IN RF-CCP ARGON DISCHARGE AND CORRELATION WITH OES D MENDIL, H LAHMAR, L HENNI, M ALIM, D LOUHIBI, K HENDA | | |
| AND TEMPERATURE BY DEVELOPED LANGMUIR PROBE IN RF-CCP ARGON DISCHARGE AND CORRELATION WITH OES D MENDIL, H LAHMAR, L HENNI, M ALIM, D LOUHIBI, K HENDA Energy (eV) 10 (30), 40-50, 0 | | |
Prof. Tahar Touam, Ph.D.Laboratory of Semiconductors, Badji Mokhtar-Annaba University, Algeria在 univ-annaba.dz 的电子邮件经过验证
