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Triratna Muneshwar
Triratna Muneshwar
在 iitb.ac.in 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Comparing XPS on bare and capped ZrN films grown by plasma enhanced ALD: Effect of ambient oxidation
T Muneshwar, K Cadien
Applied Surface Science 435, 367-376, 2018
632018
Achieving ultrahigh corrosion resistance and conductive zirconium oxynitride coating on metal bipolar plates by plasma enhanced atomic layer deposition
XZ Wang, TP Muneshwar, HQ Fan, K Cadien, JL Luo
Journal of Power Sources 397, 32-36, 2018
502018
Development of low temperature RF magnetron sputtered ITO films on flexible substrate
TP Muneshwar, V Varma, N Meshram, S Soni, RO Dusane
Solar Energy Materials and Solar Cells 94 (9), 1448-1450, 2010
402010
Balancing the corrosion resistance and through-plane electrical conductivity of Cr coating via oxygen plasma treatment
XZ Wang, HQ Fan, T Muneshwar, K Cadien, JL Luo
Journal of Materials Science & Technology 61, 75-84, 2021
342021
Surface reaction kinetics in atomic layer deposition: An analytical model and experiments
T Muneshwar, K Cadien
Journal of Applied Physics 124 (9), 2018
322018
AxBAxB… pulsed atomic layer deposition: Numerical growth model and experiments
T Muneshwar, K Cadien
Journal of Applied Physics 119 (8), 2016
322016
Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2+ 95% N2) plasma
T Muneshwar, K Cadien
Journal of Vacuum Science & Technology A 33 (3), 2015
282015
Probing initial-stages of ALD growth with dynamic in situ spectroscopic ellipsometry
T Muneshwar, K Cadien
Applied Surface Science 328, 344-348, 2015
272015
Sustained hole inversion layer in a wide-bandgap metal-oxide semiconductor with enhanced tunnel current
G Shoute, A Afshar, T Muneshwar, K Cadien, D Barlage
Nature communications 7 (1), 10632, 2016
232016
Atomic Layer Deposition: Fundamentals, Practice, and Challenges
T Muneshwar, M Miao, ER Borujeny, K Cadien
Handbook of Thin Film Deposition, 359-377, 2018
222018
Zr2N2O Coating-Improved Corrosion Resistance for the Anodic Dissolution Induced by Cathodic Transient Potential
XZ Wang, H Luo, T Muneshwar, HQ Fan, K Cadien, JL Luo
ACS applied materials & interfaces 10 (46), 40111-40124, 2018
212018
Plasma enhanced atomic layer deposition of ZnO with diethyl zinc and oxygen plasma: Effect of precursor decomposition
T Muneshwar, G Shoute, D Barlage, K Cadien
Journal of Vacuum Science & Technology A 34 (5), 2016
202016
Saturation Behavior of Atomic Layer Deposition MnOx from Bis(Ethylcyclopentadienyl) Manganese and Water: Saturation Effect on Coverage of Porous Oxygen …
MP Clark, T Muneshwar, M Xiong, K Cadien, DG Ivey
ACS Applied Nano Materials 2 (1), 267-277, 2018
172018
Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
T Muneshwar, K Cadien
Journal of Vacuum Science & Technology A 33 (6), 2015
122015
TiO2-HfN Radial Nano-Heterojunction: A Hot Carrier Photoanode for Sunlight-Driven Water-Splitting
S Zeng, T Muneshwar, S Riddell, AP Manuel, E Vahidzadeh, R Kisslinger, ...
Catalysts 11 (11), 1374, 2021
92021
Handbook of Thin Film Deposition
T Muneshwar, M Miao, ER Borujeny, K Cadien
Elsevier, 2018
92018
Tetraallyltin precursor for plasma enhanced atomic layer deposition of tin oxide: Growth study and material characterization
T Muneshwar, D Barlage, K Cadien
Journal of Vacuum Science & Technology A 37 (3), 2019
62019
Parasitic Surface Reactions in High-Aspect Ratio Via Filling using ALD: A Stochastic Kinetic Model
T Muneshwar, G Shoute, D Barlage, K Cadien
2018 IEEE International Electron Devices Meeting (IEDM), 40.2. 1-40.2. 4, 2018
32018
ZnO Schottky Nanodiodes Processed From Plasma-Enhanced Atomic Layer Deposition at Near Room Temperature
M Shen, TP Muneshwar, KC Cadien, YY Tsui, DW Barlage
IEEE Transactions on Electron Devices 65 (10), 4513-4519, 2018
32018
Stoichiometry controlled homogeneous ternary oxide growth in showerhead atomic layer deposition reactor and application for ZrxHf1− xO2
T Muneshwar, D Barlage, K Cadien
Journal of Vacuum Science & Technology A 39 (3), 2021
12021
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