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JEEVESH KUMAR
JEEVESH KUMAR
IIT(ISM) Dhanbad
在 iitism.ac.in 的电子邮件经过验证
标题
引用次数
引用次数
年份
Positive Threshold Voltage Shift in AlGaN/GaN HEMTs and E-Mode Operation By O Based Gate Stack Engineering
SD Gupta, A Soni, V Joshi, J Kumar, R Sengupta, H Khand, B Shankar, ...
IEEE Transactions on Electron Devices 66 (6), 2544-2550, 2019
402019
Visualizing Oxidation Mechanisms in Few-Layered Black Phosphorus via In Situ Transmission Electron Microscopy
AE Naclerio, DN Zakharov, J Kumar, B Rogers, CL Pint, M Shrivastava, ...
ACS applied materials & interfaces 12 (13), 15844-15854, 2020
222020
Stone–Wales defect and vacancy-assisted enhanced atomic orbital interactions between graphene and ambient gases: A first-principles insight
J Kumar, Ansh, M Shrivastava
ACS omega 5 (48), 31281-31288, 2020
212020
MoS2 Doping Using Potassium Iodide for Reliable Contacts and Efficient FET Operation
K Hemanjaneyulu, J Kumar, M Shrivastava
IEEE Transactions on Electron Devices 66 (7), 3224-3228, 2019
182019
Chalcogen-assisted enhanced atomic orbital interaction at TMD–Metal interface and sulfur passivation for overall performance boost of 2-D TMD FETs
J Kumar, G Sheoran, HB Variar, R Mishra, H Kuruva, A Meersha, A Mishra, ...
IEEE Transactions on Electron Devices 67 (2), 717-724, 2020
152020
Electrothermal transport induced material reconfiguration and performance degradation of CVD-grown monolayer MoS2 transistors
Ansh, J Kumar, G Sheoran, M Shrivastava
npj 2D Materials and Applications 4 (1), 37, 2020
142020
Selective Electron or Hole Conduction in Tungsten Diselenide (WSe2) Field-Effect Transistors by Sulfur-Assisted Metal-Induced Gap State Engineering
J Kumar, G Sheoran, R Mishra, S Raghavan, M Shrivastava
IEEE Transactions on Electron Devices 67 (1), 383-388, 2019
112019
Origin of electrically induced defects in monolayer MoS2 grown by chemical vapor deposition
A Ansh, U Patbhaje, J Kumar, A Meersha, M Shrivastava
Communications Materials 4 (1), 8, 2023
82023
Carbon vacancy assisted contact resistance engineering in graphene FETs
J Kumar, A Meersha, HB Variar, A Mishra, M Shrivastava
IEEE Transactions on Electron Devices 69 (4), 2066-2073, 2022
82022
Defect assisted metal-TMDs interface engineering: A first principle insight
J Kumar, A Ansh, H Kuruva, M Shrivastava
2020 Device Research Conference (DRC), 1-2, 2020
82020
Role of chalcogen defect introducing metal-induced Gap states and Its implications for metal–TMDs’ interface chemistry
J Kumar, M Shrivastava
ACS omega 8 (11), 10176-10184, 2023
72023
First-principles molecular dynamics insight into the atomic level degradation pathway of phosphorene
J Kumar, M Shrivastava
ACS omega 7 (1), 696-704, 2022
72022
Time dependent shift in SOA boundary and early breakdown of epi-stack in AlGaN/GaN HEMTs under fast cyclic transient stress
B Shankar, S Shikha, A Singh, J Kumar, A Soni, SD Gupta, S Raghavan, ...
IEEE Transactions on Device and Materials Reliability 20 (3), 562-569, 2020
72020
Unveiling unintentional fluorine doping in TMDs during the reactive ion etching: Root cause analysis, physical insights, and solution
K Hemanjaneyulu, A Meersha, J Kumar, M Shrivastava
IEEE Transactions on Electron Devices 69 (4), 1956-1963, 2022
52022
First Insights into Electro-Thermal Stress Driven Time-Dependent Permanent Degradation Failure of CVD Monolayer MoS2 Channel
A Ansh, G Sheoran, J Kumar, M Shrivastava
2020 IEEE International Reliability Physics Symposium (IRPS), 1-4, 2020
52020
H2S assisted contact engineering: a universal approach to enhance hole conduction in all TMD Field-Effect Transistors and achieve ambipolar CVD MoS2 Transistors
J Kumar, RK Mishra, S Raghavan, M Shrivastava
arXiv preprint arXiv:1901.02148, 2019
42019
Breathing mode’s temperature coefficient estimation and interlayer phonon scattering model of few-layer phosphorene
J Kumar, U Patbhaje, M Shrivastava
ACS omega 7 (48), 43462-43467, 2022
32022
Unified Mechanism for Graphene FET’s Electrothermal Breakdown and Its Implications on Safe Operating Limits
A Mishra, A Meersha, NK Kranthi, J Kumar, NSV Bellamkonda, HB Variar, ...
IEEE Transactions on Electron Devices 68 (5), 2530-2537, 2021
32021
Introduction of Near to Far Infrared Range Direct Band Gaps in Graphene: A First Principle Insight
J Kumar, Ansh, M Shrivastava
ACS omega 6 (8), 5619-5626, 2021
32021
Physical insights into phosphorene transistor degradation under exposure to atmospheric conditions and electrical stress
J Kumar, A Yadav, A Singh, A Naclerio, D Zakharov, P Kidambi, ...
2020 IEEE International Reliability Physics Symposium (IRPS), 1-4, 2020
32020
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