关注
Seunggi Seo
标题
引用次数
引用次数
年份
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
S Seo, BC Yeo, SS Han, CM Yoon, JY Yang, J Yoon, C Yoo, H Kim, Y Lee, ...
ACS applied materials & interfaces 9 (47), 41607-41617, 2017
1012017
Bending stability of flexible amorphous IGZO thin film transistors with transparent IZO/Ag/IZO oxide–metal–oxide electrodes
YC Kim, SJ Lee, IK Oh, S Seo, H Kim, JM Myoung
Journal of Alloys and Compounds 688, 1108-1114, 2016
602016
Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO 2 films obtained from metal halide and amide precursors
IK Oh, BE Park, S Seo, BC Yeo, J Tanskanen, WH Kim, H Kim
Journal of Materials Chemistry C 6 (27), 7367-7376, 2018
452018
Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides
T Nam, S Seo, H Kim
Journal of Vacuum Science & Technology A 38 (3), 2020
372020
Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor
T Nam, H Lee, T Choi, S Seo, CM Yoon, Y Choi, H Jeong, HK Lingam, ...
Applied Surface Science 485, 381-390, 2019
372019
Molecular oxidation of surface–CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study
S Seo, T Nam, H Kim, B Shong
Applied Surface Science 457, 376-380, 2018
342018
Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition
IK Oh, WH Kim, L Zeng, J Singh, D Bae, AJM Mackus, JG Song, S Seo, ...
ACS nano 14 (2), 1757-1769, 2020
312020
Effects of O2 plasma treatment on moisture barrier properties of SiO2 grown by plasma-enhanced atomic layer deposition
Y Lee, S Seo, IK Oh, S Lee, H Kim
Ceramics International 45 (14), 17662-17668, 2019
212019
Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors
Y Lee, T Nam, S Seo, H Yoon, IK Oh, CH Lee, H Yoo, HJ Kim, W Choi, ...
ACS Applied Materials & Interfaces 13 (17), 20349-20360, 2021
182021
Surface energy change of atomic-scale metal oxide thin films by phase transformation
IK Oh, L Zeng, JE Kim, JS Park, K Kim, H Lee, S Seo, MR Khan, S Kim, ...
ACS nano 14 (1), 676-687, 2020
162020
Moisture barrier properties of low-temperature atomic layer deposited Al2O3 using various oxidants
T Nam, H Lee, S Seo, SM Cho, B Shong, H Kim
Ceramics International 45 (15), 19105-19112, 2019
152019
Simultaneous improvement of the dielectric constant and leakage currents of ZrO 2 dielectrics by incorporating a highly valent Ta 5+ element
BE Park, IK Oh, JS Park, S Seo, D Thompson, H Kim
Journal of Materials Chemistry C 6 (36), 9794-9801, 2018
152018
Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition
WJ Woo, IK Oh, BE Park, Y Kim, J Park, S Seo, JG Song, H Jung, D Kim, ...
2D Materials 6 (1), 015019, 2018
112018
Hydrogen plasma-enhanced atomic layer deposition of hydrogenated amorphous carbon thin films
T Choi, S Yeo, JG Song, S Seo, B Jang, SH Kim, H Kim
Surface and Coatings Technology 344, 12-20, 2018
102018
Reaction Mechanisms of Non-hydrolytic Atomic Layer Deposition of Al2O3 with a Series of Alcohol Oxidants
S Seo, WJ Woo, Y Lee, H Yoon, M Kim, IK Oh, SM Chung, H Kim, ...
The Journal of Physical Chemistry C 125 (33), 18151-18160, 2021
92021
Display Device and Fabricating Method Thereof
HK Seunggi Seo, Il-Kwon Oh, Ho-Jin Kim, ChoongKeun Yoo, YongBaek Lee
US Patent 10,396,309, 2019
82019
MoS2 doping by atomic layer deposition of high-k dielectrics using alcohol as process oxidants
WJ Woo, S Seo, T Nam, Y Kim, D Kim, JG Song, IK Oh, JH Lim, HJ Kim, ...
Applied Surface Science 541, 148504, 2021
72021
Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
Y Lee, S Seo, T Nam, H Lee, H Yoon, S Sun, IK Oh, S Lee, B Shong, ...
Applied Surface Science 568, 150939, 2021
62021
Optical Reflection from Unforbidden Diffraction of Block Copolymer Templated Gyroid Films
S Jo, T Jun, HI Jeon, S Seo, H Kim, S Lee, DY Ryu
ACS Macro Letters 10 (12), 1609-1615, 2021
62021
Amorphous Ge-Se-S chalcogenide alloys via post plasma sulfurization of atomic layer deposition GeSe for ovonic threshold switch applications
S Jun, S Seo, S Park, TH Kim, M Lee, SM Hong, T Kim, S Chung, T Lee, ...
Journal of Alloys and Compounds 947, 169514, 2023
52023
系统目前无法执行此操作,请稍后再试。
文章 1–20