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| Germination of Chenopodium album in response to microwave plasma treatment B Sera, V Stranák, M Serý, M Tichý, P Spatenka Plasma Science and Technology 10 (4), 506, 2008 | 164 | 2008 |
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| An experimental study of plasma density determination by a cylindrical Langmuir probe at different pressures and magnetic fields in a cylindrical magnetron discharge in heavy … E Passoth, P Kudrna, C Csambal, JF Behnke, M Tichý, V Helbig Journal of Physics D: Applied Physics 30 (12), 1763, 1997 | 115 | 1997 |
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| Comparative measurements of the plasma potential with the ball-pen and emissive probes on the CASTOR tokamak J Adamek, J Stöckel, I Ďuran, M Hron, R Panek, M Tichý, R Schrittwieser, ... Czechoslovak Journal of Physics 55, 235-242, 2005 | 84 | 2005 |
| Advanced integrated stationary afterglow method for experimental study of recombination of processes of H3+ and D3+ ions with electrons R Plasil, J Glosk, V Poterya, P Kudrna, J Rusz, M Tichy, A Pysanenko International Journal of Mass Spectrometry 218 (2), 105-130, 2002 | 72 | 2002 |
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| Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system V Straňák, S Block, S Drache, Z Hubička, CA Helm, L Jastrabík, M Tichý, ... Surface and Coatings Technology 205 (8-9), 2755-2762, 2011 | 68 | 2011 |
| A contribution to the assessment of the influence of collisions on the measurements with Langmuir probes in the thick sheath working regime S Klagge, M Tichý Czechoslovak Journal of Physics B 35, 988-1006, 1985 | 68 | 1985 |
| Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti–Cu thin films V Stranak, M Cada, Z Hubicka, M Tichy, R Hippler Journal of Applied Physics 108 (4), 2010 | 67 | 2010 |
| The recombination of H3+ ions with electrons: dependence on partial pressure of H2 J Glosık, R Plašil, V Poterya, P Kudrna, M Tichý Chemical Physics Letters 331 (2-4), 209-214, 2000 | 67 | 2000 |
| Emissive probe diagnostics in low temperature plasma–effect of space charge and variations of electron saturation current A Marek, M Jilek, I Pickova, P Kudrna, M Tichý, R Schrittwieser, C Ionita Contributions to Plasma Physics 48 (5‐7), 491-496, 2008 | 66 | 2008 |
| Emissive probe measurements of plasma potential fluctuations in the edge plasma regions of tokamaks P Balan, R Schrittwieser, C Ioniţă, JA Cabral, HFC Figueiredo, ... Review of scientific instruments 74 (3), 1583-1587, 2003 | 66 | 2003 |
| Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure V Straňák, M Čada, M Quaas, S Block, R Bogdanowicz, Š Kment, H Wulff, ... Journal of Physics D: Applied Physics 42 (10), 105204, 2009 | 63 | 2009 |
| Advanced integrated stationary afterglow method for experimental study of recombination of processes of H3+ and D3+ ions with electrons R Plašil, J Glosık, V Poterya, P Kudrna, J Rusz, M Tichý, A Pysanenko International Journal of Mass Spectrometry 218 (2), 105-130, 2002 | 61 | 2002 |
| Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering V Stranak, M Quaas, R Bogdanowicz, H Steffen, H Wulff, Z Hubicka, ... Journal of Physics D: Applied Physics 43 (28), 285203, 2010 | 53 | 2010 |
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| Deposition of rutile (TiO2) with preferred orientation by assisted high power impulse magnetron sputtering V Stranak, AP Herrendorf, H Wulff, S Drache, M Cada, Z Hubicka, M Tichy, ... Surface and Coatings Technology 222, 112-117, 2013 | 48 | 2013 |
