| Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma T Cummins, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O’Gorman, ... Applied Physics Letters 100 (6), 2012 | 63 | 2012 |
| Reactive amine surfaces for biosensor applications, prepared by plasma-enhanced chemical vapour modification of polyolefin materials C Volcke, RP Gandhiraman, V Gubala, J Raj, T Cummins, G Fonder, ... Biosensors and Bioelectronics 25 (8), 1875-1880, 2010 | 50 | 2010 |
| Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources T Cummins, C O'Gorman, P Dunne, E Sokell, G O'Sullivan, P Hayden Applied Physics Letters 105 (4), 2014 | 25 | 2014 |
| The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm C O’Gorman, T Otsuka, N Yugami, W Jiang, A Endo, B Li, T Cummins, ... Applied Physics Letters 100 (14), 2012 | 24 | 2012 |
| A 6.7-nm beyond EUV source as a future lithography source T Otsuka, B Li, C O'Gorman, T Cummins, D Kilbane, T Higashiguchi, ... Extreme Ultraviolet (EUV) Lithography III 8322, 342-351, 2012 | 21 | 2012 |
| PECVD coatings for functionalization of point-of-care biosensor surfaces RP Gandhiraman, V Gubala, CC O’Mahony, T Cummins, J Raj, A Eltayeb, ... Vacuum 86 (5), 547-555, 2012 | 21 | 2012 |
| CO2 laser pulse shortening by laser ablation of a metal target T Donnelly, M Mazoyer, A Lynch, G O’Sullivan, F O’Reilly, P Dunne, ... Review of Scientific Instruments 83 (3), 2012 | 13 | 2012 |
| Recent progress in source development for lithography at 6. x nm G O'Sullivan, T Cummins, P Dunne, A Endo, P Hayden, T Higashiguchi, ... Physica Scripta 2013 (T156), 014105, 2013 | 11 | 2013 |
| Laser produced plasma for efficient extreme ultraviolet light sources T Donnelly, T Cummins, C O'Gorman, B Li, CS Harte, F O'Reilly, E Sokell, ... AIP Conference Proceedings 1438 (1), 155-160, 2012 | 4 | 2012 |
| Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithography T Cummins University College Dublin (Ireland), 2014 | 1 | 2014 |
| Laser-produced plasma UTA emission in 3-7nm spectral region T Higashiguchi, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O'Gorman, ... Extreme Ultraviolet (EUV) Lithography III 8322, 757-765, 2012 | 1 | 2012 |
| Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging B Li, A Endo, T Otsuka, C O'Gorman, T Cummins, T Donnelly, D Kilbane, ... Advances in X-Ray/EUV Optics and Components VI 8139, 217-225, 2011 | 1 | 2011 |
| Investigating the effects of laser intensity and pulse duration on 6.7-nm BEUV emission from Gadolinium plasma T Cummins, T Otsuka, N Yugami, W Jiang, A Endo, B Li, C O'Gorman, ... Short-Wavelength Imaging and Spectroscopy Sources 8678, 100-107, 2012 | | 2012 |
| Recent results on the development of extreme ultraviolet sources for lithography and metrology at 6. x nm G O'Sullivan, L Bowen, P Dunne, T Otsuka, T Higashiguchi, N Yugami, ... Journal of Physics: Conference Series 388 (15), 152020, 2012 | | 2012 |
| Shorter wavelength EUV source around 6. X nm by rare-earth plasma T Otsuka, D Kilbane, T Cummins, C O'Gorman, P Dunne, G O'Sullivan, ... Advances in X-Ray/EUV Optics and Components VI 8139, 248-257, 2011 | | 2011 |
| Optimisation of CO2 laser-produced Sn plasmas for next generation semiconductor lithography sources T Cummins, M Mazoyer, G O’Sullivan, E Sokell, P Dunne, F O’Reilly, ... | | 2010 |
| CO2 laser-produced tin plasmas for next generation semiconductor lithography sources T Cummins, G O’Sullivan, E Sokell, P Dunne, F O’Reilly, P Sheridan, ... | | 2010 |
| Time and Space Resolved Optical Plasma Diagnostics of Table-Top Scale Laser Produced Tin Plasmas C Fallon, P Hayden, T Cummins, CO Gorman, E Sokell, GO Sullivan, ... | | |
Padraig DunneUniversity College Dublin在 ucd.ie 的电子邮件经过验证
