| Intelligent character recognition using fully convolutional neural networks R Ptucha, FP Such, S Pillai, F Brockler, V Singh, P Hutkowski Pattern recognition 88, 604-613, 2019 | 180 | 2019 |
| Robust spatial filtering with graph convolutional neural networks FP Such, S Sah, MA Dominguez, S Pillai, C Zhang, A Michael, ND Cahill, ... IEEE Journal of Selected Topics in Signal Processing 11 (6), 884-896, 2017 | 178 | 2017 |
| Key frame extraction for salient activity recognition S Kulhare, S Sah, S Pillai, R Ptucha 2016 23rd International Conference on Pattern Recognition (ICPR), 835-840, 2016 | 36 | 2016 |
| Image description through fusion based recurrent multi-modal learning RM Oruganti, S Sah, S Pillai, R Ptucha 2016 IEEE International Conference on Image Processing (ICIP), 3613-3617, 2016 | 18 | 2016 |
| Making digital twins using the deep learning kit (DLK) L Pang, S Pillai, T Nguyen, M Meyer, A Baranwal, H Yu, M Niewczas, ... Photomask Technology 2019 11148, 41-53, 2019 | 9 | 2019 |
| Five deep learning recipes for the mask-making industry A Baranwal, M Meyer, T Nguyen, S Pillai, N Nakayamada, M Wahlsten, ... Photomask Technology 2019 11148, 31-49, 2019 | 6 | 2019 |
| A deep learning mask analysis toolset using mask SEM digital twins AK Baranwal, S Pillai, T Nguyen, J Yashima, J Dewitt, N Nakayamada, ... Photomask Technology 2020 11518, 177-197, 2020 | 4 | 2020 |
| Methods and systems for registering images for electronic designs S Pillai, T Nguyen, A Baranwal US Patent 12,045,996, 2024 | 2 | 2024 |
| Methods and systems for generating shape data for electronic designs S Pillai, T Nguyen, A Baranwal US Patent 11,847,400, 2023 | 1 | 2023 |
| Methods and systems for generating shape data for electronic designs S Pillai, T Nguyen, A Baranwal US Patent 11,250,199, 2022 | 1 | 2022 |
| An SEM-based deep defect classification system for VSB mask writer that works with die-to-die and die-to-database inspection methods using multiple digital twins built with the … AK Baranwal, S Pillai, T Nguyen, J Yashima, J DeWitt, N Nakayamada, ... Photomask Technology 2021 11855, 118550D, 2021 | 1 | 2021 |
| Modeling of a design in reticle enhancement technology PJ Ungar, A Fujimura, A Baranwal, S Pillai US Patent App. 18/515,140, 2024 | | 2024 |
| Methods and systems for generating shape data for electronic designs S Pillai, T Nguyen, A Baranwal US Patent App. 18/488,823, 2024 | | 2024 |
| Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography A Fujimura, T Nguyen, A Baranwal, MJ Meyer, S Pillai US Patent 11,264,206, 2022 | | 2022 |
| A deep learning toolset to mask analysis with SEM digital twins A Baranwal, S Pillai, T Nguyen, J Yashima, J Dewitt, N Nakayamada, ... Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation …, 2021 | | 2021 |
| Dysarthric Speech Recognition and Offline Handwriting Recognition using Deep Neural Networks SB Pillai Rochester Institute of Technology, 2017 | | 2017 |
| Convolutional Deep Neural Network on a GPU S Pillai, S Pillai | | |
