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Felix Palumbo
Felix Palumbo
Consejo de Investigaciones Cientificas y Tecnicas - UTN
在 conicet.gov.ar 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Dielectric breakdown mechanisms in gate oxides
S Lombardo, JH Stathis, BP Linder, KL Pey, F Palumbo, CH Tung
Journal of applied physics 98 (12), 2005
5442005
A Review on Dielectric Breakdown in Thin Dielectrics: Silicon Dioxide, High‐k, and Layered Dielectrics
F Palumbo, C Wen, S Lombardo, S Pazos, F Aguirre, M Eizenberg, F Hui, ...
Advanced Functional Materials 30 (18), 1900657, 2020
1802020
Standards for the characterization of endurance in resistive switching devices
M Lanza, R Waser, D Ielmini, JJ Yang, L Goux, J Suñe, AJ Kenyon, ...
ACS nano 15 (11), 17214-17231, 2021
1602021
Percolation path and dielectric-breakdown-induced-epitaxy evolution during ultrathin gate dielectric breakdown transient
CH Tung, KL Pey, LJ Tang, MK Radhakrishnan, WH Lin, F Palumbo, ...
Applied Physics Letters 83 (11), 2223-2225, 2003
1092003
On the thermal models for resistive random access memory circuit simulation
JB Roldán, G González-Cordero, R Picos, E Miranda, F Palumbo, ...
Nanomaterials 11 (5), 1261, 2021
582021
Dielectric breakdown in chemical vapor deposited hexagonal boron nitride
L Jiang, Y Shi, F Hui, K Tang, Q Wu, C Pan, X Jing, H Uppal, F Palumbo, ...
ACS applied materials & interfaces 9 (45), 39758-39770, 2017
572017
Continuous High-Altitude Measurements of Cosmic Ray Neutrons and SEU/MCU at Various Locations: Correlation and Analyses Based-On MUSCA SEP
G Hubert, R Velazco, C Federico, A Cheminet, C Silva-Cardenas, ...
IEEE Transactions on Nuclear Science 60 (4), 2418-2426, 2013
492013
A novel approach to characterization of progressive breakdown in high-k/metal gate stacks
R Pagano, S Lombardo, F Palumbo, P Kirsch, SA Krishnan, C Young, ...
Microelectronics Reliability 48 (11-12), 1759-1764, 2008
422008
Physical mechanism of progressive breakdown in gate oxides
F Palumbo, S Lombardo, M Eizenberg
Journal of Applied Physics 115 (22), 2014
402014
150 nm× 200 nm cross‐point hexagonal boron nitride‐based memristors
B Yuan, X Liang, L Zhong, Y Shi, F Palumbo, S Chen, F Hui, X Jing, ...
Advanced Electronic Materials 6 (12), 1900115, 2020
332020
Application of the quasi-static memdiode model in cross-point arrays for large dataset pattern recognition
FL Aguirre, SM Pazos, F Palumbo, J Suñé, E Miranda
IEEE Access 8, 202174-202193, 2020
282020
Radiation hardness of silicon photomultipliers under 60Co γ-ray irradiation
R Pagano, S Lombardo, F Palumbo, D Sanfilippo, G Valvo, G Fallica, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2014
252014
Temperature of conductive nanofilaments in hexagonal boron nitride based memristors showing threshold resistive switching
M Lanza, F Palumbo, Y Shi, F Aguirre, S Boyeras, B Yuan, E Yalon, ...
Advanced Electronic Materials 8 (8), 2100580, 2022
242022
Hf-based high-k dielectrics for p-Ge MOS gate stacks
S Fadida, F Palumbo, L Nyns, D Lin, S Van Elshocht, M Caymax, ...
Journal of Vacuum Science & Technology B 32 (3), 2014
242014
Degradation characteristics of metal/Al2O3/n-InGaAs capacitors
F Palumbo, M Eizenberg
Journal of Applied Physics 115 (1), 2014
242014
Analytic expression for the Fowler–Nordheim V–I characteristic including the series resistance effect
E Miranda, F Palumbo
Solid-state electronics 61 (1), 93-95, 2011
222011
Formation and Characterization of Filamentary Current Paths in-Based Resistive Switching Structures
F Palumbo, E Miranda, G Ghibaudo, V Jousseaume
IEEE electron device letters 33 (7), 1057-1059, 2012
212012
Structure and conductance of the breakdown spot during the early stages of progressive breakdown
G Condorelli, SA Lombardo, F Palumbo, KL Pey, CH Tung, LJ Tang
IEEE Transactions on Device and Materials Reliability 6 (4), 534-541, 2006
192006
Structure of the oxide damage under progressive breakdown
F Palumbo, G Condorelli, S Lombardo, KL Pey, CH Tung, LJ Tang
Microelectronics Reliability 45 (5-6), 845-848, 2005
192005
Comparative study of the breakdown transients of thin Al2O3 and HfO2 films in MIM structures and their connection with the thermal properties of materials
S Pazos, F Aguirre, E Miranda, S Lombardo, F Palumbo
Journal of Applied Physics 121 (9), 2017
182017
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