| In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process J Pereira, LE Pichon, R Dussart, C Cardinaud, CY Duluard, ... Applied Physics Letters 94 (7), 2009 | 107 | 2009 |
| Progresses on the use of two-photon absorption laser induced fluorescence (TALIF) diagnostics for measuring absolute atomic densities in plasmas and flames K Gazeli, G Lombardi, X Aubert, CY Duluard, S Prasanna, K Hassouni plasma 4 (1), 145-171, 2021 | 32 | 2021 |
| PTFE Surface Etching in the Post‐discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species T Dufour, J Hubert, P Viville, CY Duluard, S Desbief, R Lazzaroni, ... Plasma processes and polymers 9 (8), 820-829, 2012 | 29 | 2012 |
| Plasma diagnostics of an Ar/NH3 direct-current reactive magnetron sputtering discharge for SiNx deposition F Henry, CY Duluard, A Batan, F Reniers Thin Solid Films 520 (20), 6386-6392, 2012 | 24 | 2012 |
| Influence of ambient air on the flowing afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma CY Duluard, T Dufour, J Hubert, F Reniers Journal of Applied Physics 113 (9), 2013 | 17 | 2013 |
| SO2 passivating chemistry for silicon cryogenic deep etching CY Duluard, R Dussart, T Tillocher, LE Pichon, P Lefaucheux, M Puech, ... Plasma Sources Science and Technology 17 (4), 045008, 2008 | 14 | 2008 |
| Picosecond two-photon absorption laser-induced fluorescence (ps-TALIF) in krypton: The role of photoionization on the density depletion of the fluorescing state Kr 5p′[3/2] 2 K Gazeli, X Aubert, S Prasanna, CY Duluard, G Lombardi, K Hassouni Physics of Plasmas 28 (4), 2021 | 11 | 2021 |
| Investigation of N (4S) kinetics during the transients of a strongly emissive pulsed ECR plasma using ns-TALIF E Bisceglia, S Prasanna, K Gazeli, X Aubert, CY Duluard, G Lombardi, ... Plasma Sources Science and Technology 30 (9), 095001, 2021 | 9 | 2021 |
| Neutral species in inductively coupled SF6/SiCl4 plasmas CY Duluard, P Ranson, LE Pichon, EH Oubensaid, J Pereira, ... Journal of Physics D: Applied Physics 42 (11), 115206, 2009 | 9 | 2009 |
| Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching CY Duluard, P Ranson, LE Pichon, J Pereira, EH Oubensaid, ... Journal of Micromechanics and Microengineering 21 (6), 065015, 2011 | 8 | 2011 |
| Peculiarities of measuring fluorescence decay times by a streak camera for ps-TALIF experiments in reactive plasmas L Invernizzi, CY Duluard, H Höft, K Hassouni, G Lombardi, K Gazeli, ... Measurement Science and Technology 34 (9), 095203, 2023 | 7 | 2023 |
| Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching EH Oubensaid, CY Duluard, LE Pichon, J Pereira, M Boufnichel, ... Semiconductor science and technology 24 (7), 075022, 2009 | 7 | 2009 |
| Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy EH Oubensaid, CY Duluard, LE Pichon, B Morillon, M Boufnichel, ... Microelectronic engineering 86 (11), 2262-2269, 2009 | 6 | 2009 |
| Comparison of three optical diagnostic techniques for the measurement of boron atom density in a H2/B2H6 microwave plasma X Aubert, CY Duluard, N Sadeghi, A Gicquel Plasma Sources Science and Technology 26 (11), 115011, 2017 | 2 | 2017 |
| Etude de nouvelles voies de passivation non polymérisante pour la gravure profonde du silicium CY Duluard Université d'Orléans, 2009 | 2 | 2009 |
| Depopulation mechanisms of atomic hydrogen in the n= 3 level following two-photon excitation by a picosecond laser CY Duluard, L Invernizzi, K Hassouni, G Lombardi, K Gazeli, S Prasanna Plasma Sources Science and Technology 33 (1), 015003, 2024 | 1 | 2024 |
| Dynamics of the formation and loss of boron atoms in a H2/B2H6 microwave plasma CY Duluard, X Aubert, N Sadeghi, A Gicquel APS Annual Gaseous Electronics Meeting Abstracts, FT4. 003, 2016 | | 2016 |
| Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O radiofrequency plasma used for polymer surface treatment CY Duluard, T Dufour, J Hubert, F Reniers arXiv preprint arXiv:1605.08058, 2016 | | 2016 |
| Precautions for using krypton as a calibration species for Two-Photon Absorption Laser Induced Fluorescence of hydrogen and nitrogen atoms CY Duluard, X Aubert | | |
